RF magnetron sputter의 분위기에 따른 TiO2 박막의 특성
Characterizations of TiO2 thin films with atmosphere control of the RF magnetron sputtering
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초록
RF 마그네트론 스퍼터링으로 가스조성비와 기판의 온도를 변화시키면서 TiO2 박막을 성장하였다. XRD, SEM,AFM 및 분광광도계를 이용하여 박막의 구조와 광학적 특성을 고찰하였다. 박막에는 아나타제 결정성만 관찰되었으며 온도가 높아질수록 회절 피크의 강도가 증가하였다. 산소농도가 증가함에 따라 기둥구조의 결정성장률이 감소되었으며 굴절률과 흡수율은 감소하였다. TiO2 박막은 300~400oC의 기판온도와 10 %의 O2 분위기에서 성장한 박막의 표면이 매끄럽고투과특성이 우수한 박막을 얻을 수 있었다.
Abstract
The TiO2 films were prepared on glass, silicon and quartz substrate at different temperature by radio frequency reactive magnetron sputtering under different flow ratios of Ar and O2 gases. The films were characterized by X-ray diffractometer (XRD), scanning electron microscope (SEM), atomic force microscope (AFM) and UV-VIS spectrophotometer. Only the anatase phase was observed in films and their diffaction peaks increased with temprature of substrate. The size of crystallites decreased with higher concentration of oxygen. Refractive index and optical absorption of thin films decreased with higher concentration of oxygen. The thin films which have good transmittance spectra and smooth surface, deposited in the sputtering ambient with 10 % of O2 at the temperature from 300oC to 400oC.
참고문헌 (9)
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