DC 마그네트론 반응성 스퍼터링법에 의해서 제작된 TiO-N 박막의 구조 및 광학적특성에 관한 연구

Abstract

Extensive efforts have been made in an attempt to utilize photocatalytic properties of TiO2 in visible range. TiO2 and TiO-N thin films were made by the DC reactive magnetron sputtering method at 300oC. Various gases (Ar, O2 and N2) were used and Ti target was impressed by 0.6 kW~5.8 kW power range. The hysteresis phenomenon of the TiO2 thin film as a function of the discharge voltage characteristic was observed to be higher as applied power increases. That of TiO-N thin film was occurred at the 5.8 kW power. The cross section and surface roughness of thin films were observed by FE-SEM and AFM. Average surface roughness of TiO-N thin film was observed as 15.9 and that of TiO2 as 13.2. The crystal phases of both TiO2 and TiO-N thin films were found to be anatase structure. The atomic b-N (396 eV peak in N 1s XPS) was shown in the rutile crystal of TiO-N and was considered acting as the origin of wavelength shift to the visible light.