본문 바로가기
KERD
논문KCI 등재

Optical and Electronic Properties of SnO2 Thin Film Fabricated by Using SILAR method

2

조회

0

다운로드

0

인용

0

참고문헌

키워드

주제분류공학일반

초록

Tin oxide thin films were fabricated on glass substrates by the successive ionic layer adsorption and reaction (SILAR) method at room temperature and ambient pressure. Before measuring their properties, all samples were annealed at 500oC for 2 h in air. Film thickness increased with the number of cycles; X-ray diffraction patterns for the annealed SnO2 thin films indicated a SnO2 single phase. Thickness of the SnO2 films increased from 12 to 50 nm as the number of cycles increased from 20 to 60. Although the optical transmittance decreased with thickness, 50 nm SnO2 thin films exhibited a high value of more than 85%. Regarding electronic properties, sheet resistance of the films decreased as thickness increased; however, the measured resistivity of the thin film was nearly constant with thickness (3×10-4 ohm/cm). From Hall measurements, the 50 nm thickness SnO2 thin film had the highest mobility of the samples (8.6 cm2/(V·s)). In conclusion, optical and electronic properties of SnO2 thin films could be controlled by adjusting the number of SILAR cycles.

Abstract

Tin oxide thin films were fabricated on glass substrates by the successive ionic layer adsorption and reaction (SILAR) method at room temperature and ambient pressure. Before measuring their properties, all samples were annealed at 500oC for 2 h in air. Film thickness increased with the number of cycles; X-ray diffraction patterns for the annealed SnO2 thin films indicated a SnO2 single phase. Thickness of the SnO2 films increased from 12 to 50 nm as the number of cycles increased from 20 to 60. Although the optical transmittance decreased with thickness, 50 nm SnO2 thin films exhibited a high value of more than 85%. Regarding electronic properties, sheet resistance of the films decreased as thickness increased; however, the measured resistivity of the thin film was nearly constant with thickness (3×10-4 ohm/cm). From Hall measurements, the 50 nm thickness SnO2 thin film had the highest mobility of the samples (8.6 cm2/(V·s)). In conclusion, optical and electronic properties of SnO2 thin films could be controlled by adjusting the number of SILAR cycles.

참고문헌 (17)

  1. E. Fortunato, "Oxide semiconductor thin film transistors : A review of recent advances", Adv. Mater, 24(22), pp.2945~2986 (2012)
  2. H. A. Klasens, "A tin oxide field effect transistor", Solid-State Electron, 7(9), pp.701~702 (1964)
  3. A. Aoki, "Tin oxide thin film transistors", J. Appl. Phys, 9(5), pp.582~582 (1970)
  4. R. E. Presley, "Tin oxide transparent thin-film transistors", J. Phys. D : Appl. Phys, 37, pp.2810~2813 (2004)
  5. M. Mizuhash, "Electrical properties of SnO2 films on various glass substrates", J. Non-Cryst. Solids, 38(1), pp.329~334 (1980)
  6. K. L. Chopra, "Transparent conductors-a status review", Thin Solid Films, 102(1), pp.1~46 (1983)
  7. E. Shanthi, "Electrical and optical properties of tin oxide films doped with F and(Sb+ F)", J. Appl. Phys, 53(3), pp.1615~1621 (1982)
  8. D. Ginley, "Effect of F, Cl and Br doping on electrical properties of sprayed SnO2 films", J. Mater. Sci. Lett, 15(6), pp.497~499 (1996)
  9. B. Stjerna, "Optical and electrical properties of radio frequency sputtered tin oxide films doped with oxygen vacancies, F, Sb, or Mo", J. Appl. Phys, 76, pp.37~97 (1994)
  10. H. M. Pathan, "Deposition of metal chalcogenide thin films by successive ionic layer adsorption and reaction(SILAR)method", Bull. Mater. Sci, 27, pp.85~111 (2004)
  11. F. Bayansal, "CuO nanostructures grown by the SILAR method : In fumence of Pb doping on the morphological structural and optical properties", Journal of Alloy and Compounds, 691, pp.378~382 (2015)
  12. A. T. Ravichandran, "Morphology, bandgap, and grain size tailoring in Cu2O thin film by SILAR method", IEEE Transactions on Nanotechnology, 14(1), pp.108~112 (2015)
  13. Yunus Akaltun, "Fabrication and characterization of NiO thin films prepared by SILAR method", Journal of Alloys and Compounds, 625, pp.144~148 (2015)
  14. T. R. Giraldi, "Effect of thickness on the electrical and optical properties of Sb-doped SnO2(ATO)thin films", J. Electroceram, 13, pp.159~165 (2004)
  15. M. D. Benoy, "Thickness dependence of the properties of indium tin oxide(ITO)films prepared by activated reactive evaporation", Braz. J. Phys, 39(7), pp.629~632 (2009)
  16. S. M. Pusawale, "Chemical synthesis and characterization of hydrous tin oxide(SnO2 : H2O)thin films", Indian Academy of Sciences, 34(34), pp.1179~1183 (2011)
  17. Y. Caglar, "Effect of channel thickness on the field effect mobility of ZnO-TFT fabricated by sol gel process", J. Alloys Compd, 621, pp.189~193 (2015)

관련 논문AI추천

이 간행물의 다른 논문 (11건)