스퍼터링 조건이 티탄산화물박막의 전기적 착색 특성에 미치는 영향
The Effect of Sputtering Conditions on the Electrochromic Properties of Titanium Oxide Thin Films
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Abstract
Titanium oxide (TiO2) films are deposited on the indium tin oxide (ITO) substrate in an Ar/O2 atmosphere by using reactive RF (Radio Frequency) magnetron sputtering technique, and Electrochromic properties and durability of TiO2 films deposited at different preparation conditions are investigated by using UV-VIS spectrophotometer and cyclic voltammetry. Li+ interalation/deintercalation in TiO2 films shows that the electrochromic properties and durability of as-deposited films strongly depend on gas pressure. TiO2 films formed in our sputtering conditions are found to remain transparent, irrespective of their Li+ ion contents. The optimum sputtering conditions for film as passive counter electrode in electrochromic devices are working pressure of 1.0 × 10-2 torr and oxygen flow raes of 10~15 sccm, respectively.
참고문헌 (2)
- "E. Avenda1. o and A. Azens", 442(201) (2003)
- "Handbook of Inorganic Electrochromic Materials" (1995), Elsevier Science