Pulsed DC 마그네트론 스퍼터링으로 제조된 다층 광학박막의 특성
The Properties of Multi-Layered Optical Thin Films Fabricated by Pulsed DC Magnetron Sputtering
1
조회
0
다운로드
1
인용
0
참고문헌
키워드
초록
Optical thin films were deposited by using a reactive pulsed DC magnetron sputtering method with a high density plasma(HDP). In this study, the effect of sputtering process conditions on the microstructure and optical properties of SiO2, TiO2, Nb2O5 thin films was clarified. These thin films had flat and dense microstructure, stable stoichiometric composition at the optimal conditions of low working pressure, high pulsed DC power and RF power(HDP). Also, the refractive index of the SiO2 thin films was almost constant, but the refractive indices of TiO2 and Nb2O5 thin films were changed depending on the microstructure of these films. Antireflection films of Air/SiO2/Nb2O5/SiO2/Nb2O5/SiO2/Nb2O5/Glass structure designed by Macleod program were manufactured by our developed sputtering system. The transmittance and reflectance of the manufactured multilayer films showed the outstanding value with the level of 95% and 0.3%, respectively, and also had excellent durability.
Abstract
Optical thin films were deposited by using a reactive pulsed DC magnetron sputtering method with a high density plasma(HDP). In this study, the effect of sputtering process conditions on the microstructure and optical properties of SiO2, TiO2, Nb2O5 thin films was clarified. These thin films had flat and dense microstructure, stable stoichiometric composition at the optimal conditions of low working pressure, high pulsed DC power and RF power(HDP). Also, the refractive index of the SiO2 thin films was almost constant, but the refractive indices of TiO2 and Nb2O5 thin films were changed depending on the microstructure of these films. Antireflection films of Air/SiO2/Nb2O5/SiO2/Nb2O5/SiO2/Nb2O5/Glass structure designed by Macleod program were manufactured by our developed sputtering system. The transmittance and reflectance of the manufactured multilayer films showed the outstanding value with the level of 95% and 0.3%, respectively, and also had excellent durability.
참고문헌 (41)
- C. K. Hwangbo, "Thin film optics", pp.74~114 (2009), Techmedia
- H. Y. Hsueh, "Inorganic Gyroid with Exceptionally Low Refractive Index from Block Copolymer Templating", Nano Lett, 10, pp.4994~5000 (2010)
- Y. J. Hong, "Organic", Inorganic composite coating for flat panel display, 2006, pp.17(2), 217~225
- G. K. Chinyama, "Stability of antireflection coatings for large area glazing", Solar Energy, 50(2), pp.105~111 (1993)
- T. H. Allen, "Properties of ion assisted deposited Silica and Titania Films", Proc. SPIE, 325, pp.93~100 (1982)
- A. P. Bradford, "The effect of the substrate temperature on the optical properties of reactively evaporated silicon oxide films", Thin Solid Films, 42, pp.361~367 (1977)
- P. Löbl, "Nucleation and growth in TiO2 films prepared by sputtering and evaporation", Thin Solid Films, 251, pp.72~79 (1994)
- M. Radecka, "The influence of thermal annealing on the structural, electrical and optical properties of TiO2-x thin films", Appl. Surf. Sci, 65-66, pp.227~234 (1993)
- N. Ozer, "Optical and electrochemical characteristics of niobium oxide films prepared by sol-gel process and magnetron sputtering A comparison", Sol. Energy Mater. Sol. Cells, 40, pp.285~296 (1996)
- P. L. Provenzano, "Flame-excited luminescence in the oxides Ta2O5, Nb2O5, TiO2, and SnO2", J. Lumin, 92(4), pp.297~305 (2001)
- G. Agarwal, "Study of surface morphology and optical properties of Nb2O5 thin films with annealing", J. Mater. Sci. : Mater. Electron, 16, pp.21~24 (2005)
- W. Hu, "NbS2", Nb2O5nanocables, 2007, pp.18(9), 1~5
- L. A. Stelmack, "Review of ion-assisted deposition: Research to production", Nucl. Instrum. Methods Phys. Res. B, 37, pp.787~793 (1989)
- K. H. Guenther, "Thin film technology in design and production of optical systems", Proc. Soc. photo-opt. Instrum. Eng, 399, pp.246~258 (1983)
- M. Meissner, "Elimination of arcing in reactive sputtering of Al2O3thin films prepared by DC pulse single magnetron", Plasma Process. Polym, 8, pp.500~504 (2011)
- P. J. Kelly, "A comparison of the characteristics of planar and cylindrical magnetrons operating in pulsed DC and AC modes", Surf. Coat. Technol, 202, pp.952~956 (2007)
- A. Dirks, "Columnar microstructure in vapor-deposited thin films", Thin Solid Films, 47, pp.219~233 (1977)
- A. Antony, "influence of target to substrate spacing on the properties of ITO thin films", Appl. Surf. Sci, 225(1–4), pp.294~301 (2004)
- D. W. Kim, "Korea Patent KR 10-1861701", ~ (2018)
- J. M. E. Harper, "mean free path of negative ions in diode sputtering", J. Vac. Sci. Technol, 15, pp.1597~1600 (1978)
- J. A. Thornton, "Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatings", J. Vac. Sci. Technol, 11, pp.666~670 (1974)
- S. M. Hu, "Silicon nitride films by reactive sputtering", J. Electrochem. Soc, 114(8), pp.826~833 (1967)
- C. H. Kim, "Characteristics of dense palladium alloy membranes formed by nano-scale nucleation and lateral growth", J. Membr. Sci, 502, pp.57~64 (2016)
- J. Hopwood, "Review of inductively coupled plasmas for plasma processing", Plasma Sources Sci. Technol, 1, pp.109~116 (1992)
- D. M. Ullevig, "Sputtering yields of electrochemically deposited metal oxide thin films", J. Vac. Sci. Technol, 20(3), pp.379~382 (1982)
- E. Medvedovski, "Advanced indium-tin oxide ceramics for sputtering targets", Ceramics International, 34(5), pp.1173~1182 (2008)
- P. Gao, "Influence of sputtering power and the substrate-target distance on the properties of ZrO2 films prepared by RF reactive sputtering", Thin Solid Films, 377-378, pp.557~561 (2000)
- M. Jerman, "Refractive index of thin films of SiO2, ZrO2, and HfO2 as a function of the films’ mass density", Appl. Opt, 44, pp.3006~3012 (2005)
- M. Harris, "Refractive index variations in dielectric films having columnar microstructure", Opt. Commun, 51(1), pp.29~32 (1984)
- E. Paparazzo, "XPS and auger spectroscopy studies on mixtures of the oxides SiO2, Al2O3, Fe2O3, and Cr2O3", J. Electron Spectroscopy and Related Phenomena, 43, pp.97~112 (1987)
- M. Mazur, "Determination of structural, mechanical and corrosion properties of Nb2O5 and (NbyCu1-y)Ox thin films deposited on Ti6Al4V alloy substrates for dental implant applications", Materials Sci. and Eng. C, 47, pp.211~221 (2015)
- Y. J. Lee, "Effect of Deposition Parameters on MgO Thin Films on Si(100) Substrates by Reactive RF Magnetron Sputtering", J. Kor. Ceram. Soc, 31, pp.643~650 (1994)
- M. H. Suhail, "dc reactive magnetron sputtering of titanium-structural and optical characterization of TiO2 films", J. Appl. Phys, 71(3), pp.1421~1427 (1992)
- H. K. Rulker, "Refractive indices of TiO2 films produced by reactive evaporation of various titanium-oxygen phases", Appl. Opt, 15(12), pp.2986~2991 (1976)
- J. Rodrıguez, "thickness dependence of the optical properties of sputter deposited Ti oxide films", Thin Solid Films, 365, pp.119~125 (2000)
- I. Sta, "Structural and optical properties of TiO2 thin films prepared by spin coating", J. Sol-Gel Sci. Technol, 72, pp.421~427 (2014)
- S. Y. Kim, "Optical Structure of multilayer coatings of antireflection lenses and their transmission characteristics", J. Opt. Soc. Kor, 6(4), pp.259~265 (1995)
- F. J. Pern, "Degradation of ZnO-based window layers for thin-film CIGS by accelerated stress exposures", Proc. SPIE Int. Soc. Opt. Eng, 7048, pp.70480~ (2008)[DOI]
- M. A. Yaklin, "Impacts of Humidity and Temperature on the Performance of Transparent Conducting Zinc Oxide", IEEE Photovoltaic Specialists Conference, 35, pp.2493~2496 (2010)
- N. E. Holm, "IR analysis of water absorption in optical multilayer structures", Thin Solid Films, 67, pp.239~244 (1980)
- T. M. Christmas, "The durability and stability of evaporated thin film filters", Opt. Laser Technol, 9, pp.109~116 (1977)