마그네트론 스퍼터링 증착률에 따른 SnO2 박막의 표면조도 및 전기광학적 특성

Abstract

The SnO2 thin films were deposited on glass substrates with radio frequency magnetron sputtering and then the influence of deposition rate on the visible right transmittance and electrical properties of the film were investigated. At the XRD analysis, while all the films didn’t show any characteristic diffraction peaks in the spectra with regardless of sputtering deposition rates, the films deposited at the deposition rate of 12.0 nm/Min. show a lower electrical resistivity of 2.76 Ω cm and a lower surface roughness of 1.57 nm. The visible transmittance is also varied with deposition rate. The average visible transmittance is enhanced from 72.18% (8.5 nm/Min.) to 73.86% (12.0 nm/Min.) and then decreased to 71.57% (15.1 nm/Min.). Due to the increased visible transmittance and decreased sheet resistance of the films, the film deposited at the deposition rate of 12.0 nm/Min. shows a higher figure of merit (2.98×10−7 Ω−1). From the results, it is concluded that the electrical and optical properties of the SnO2 films are can be enhanced at an ideal magnetron sputtering deposition rate conditions.