RF 마그네트론 스퍼터링으로 증착된 AlOx 봉지 박막을 갖는 OLED 소자의 수명 특성
Life time characteristics of OLED device with AlOx passivation film deposited by RF magnetron sputtering
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초록
We investigated the life time characteristics of OLED device with aluminium oxide(AlOx) passivation film on glass substrate and polyethylene terephthalate(PET) substrate by RF magnetron sputtering for the transparent barrier film applied to flexible OLED device. Basic buffer layer was determined as Alq3(500 nm)-LiF(300 nm)-Al(1200 nm), and the most suitable aluminium oxide(AlOx) film have been formed when the partial volume ratio of oxygen was 20% and the sputtering power was 100 watt and the minimum thickness of buffer was 2 ㎛. AlOx/epoxy hybrid film was also used as a effective passivation layer for the purpose of improving life time characteristics of OLED devices with the glass substrate and the plastic substrate. Besides, the simultaneous deposition of AlOx/epoxy film on back side of PET could result in better improvement of life time.
Abstract
We investigated the life time characteristics of OLED device with aluminium oxide(AlOx) passivation film on glass substrate and polyethylene terephthalate(PET) substrate by RF magnetron sputtering for the transparent barrier film applied to flexible OLED device. Basic buffer layer was determined as Alq3(500 nm)-LiF(300 nm)-Al(1200 nm), and the most suitable aluminium oxide(AlOx) film have been formed when the partial volume ratio of oxygen was 20% and the sputtering power was 100 watt and the minimum thickness of buffer was 2 ㎛. AlOx/epoxy hybrid film was also used as a effective passivation layer for the purpose of improving life time characteristics of OLED devices with the glass substrate and the plastic substrate. Besides, the simultaneous deposition of AlOx/epoxy film on back side of PET could result in better improvement of life time.
참고문헌 (10)
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