OLED 내구성에 미치는 무기/에폭시층 보호막의 영향
The effect of passivation film with inorganic/epoxy layers on life time characteristics of OLED device
0
조회
0
다운로드
5
인용
0
참고문헌
키워드
초록
The passivation films with epoxy layer on LiF, SiNx and LiF/SiNx inorganic layer were fabricated on OLED to protect device from the direct damage of O2 and H2O and to apply for a buffer layer between OLED device and passivation multi-layer with organic/inorganic hybrid structure as to diminish the thermal stress and expansion. Red OLED doped with 1 vol.% Rubrene in Alq3 were used as a basic device. The device structure was multi-layer of ITO(150 ㎚)/ ELM200_HIL(50 ㎚)/ ELM002_HTL(30 ㎚)/ Alq3: 1 vol.% Rubrene(30 ㎚)/ Alq3(30 ㎚)/ LiF(0.7 ㎚)/ Al(100 ㎚). LiF/epoxy applied as a protective layer didn't contribute to the improvement of life time. While in case of SiNx/epoxy, damage was done in the passivation process because of difference in heat expansion between films which could occur during the formation of epoxy film. Using LiF/SiNx/epoxy improved lifetime significantly without suffering damage in the process of forming films, therefore, the best structure of passivation film with inorganic/epoxy layers was LiF/SiNx/E1.
Abstract
The passivation films with epoxy layer on LiF, SiNx and LiF/SiNx inorganic layer were fabricated on OLED to protect device from the direct damage of O2 and H2O and to apply for a buffer layer between OLED device and passivation multi-layer with organic/inorganic hybrid structure as to diminish the thermal stress and expansion. Red OLED doped with 1 vol.% Rubrene in Alq3 were used as a basic device. The device structure was multi-layer of ITO(150 ㎚)/ ELM200_HIL(50 ㎚)/ ELM002_HTL(30 ㎚)/ Alq3: 1 vol.% Rubrene(30 ㎚)/ Alq3(30 ㎚)/ LiF(0.7 ㎚)/ Al(100 ㎚). LiF/epoxy applied as a protective layer didn't contribute to the improvement of life time. While in case of SiNx/epoxy, damage was done in the passivation process because of difference in heat expansion between films which could occur during the formation of epoxy film. Using LiF/SiNx/epoxy improved lifetime significantly without suffering damage in the process of forming films, therefore, the best structure of passivation film with inorganic/epoxy layers was LiF/SiNx/E1.
참고문헌 (12)
- Shizuo Tokito, "유기EL 디스플레이 기초와 응용", pp.192~ (2006), 성안당
- 김종환, "고분자 기판위에 다층 구조의 박막형 보호층을 적용한 투습률 향상", 전기전자재료학회논문지, 19(3), pp.255~259 (2006), 한국전기전자재료학회
- 주성후, "SiNx 박막에 의한 OLED 소자의 보호막 특성", 전기전자재료학회논문지, 19(8), pp.758~763 (2006), 한국전기전자재료학회
- Z. Y. Xie, , Appl. Phys. Lett., 84(7), pp.1207~ (2004)
- C. N. Li, , Appl. Phys. A., 80, pp.301~ (2005)
- C. W. Tang, , Appl. Phys. Lett., 51, pp.913~ (1987)
- H. Dun, , J. Electrochem. Soc.,, 128, pp.1556~ (1981)
- H. Aziz, , Appl. Phys. Lett., 72, pp.2642~ (1998)
- B. H. Cumpston, , J. Appl. Phys., 81, pp.3716~ (1997)
- V. N. Bliznyuk, , Macromolecules, 32(2), pp.361~ (1999)
- K. Yamashita, , J. Phys. D., 34(5), pp.740~ (2001)
- 하정민, , 한국재료 óc 학회지, 3(2), pp.162~ (1993)