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증착 Power의 세기와 시간에 따른 Fe-N 박막의 구조와 자성 특성

A Study on Structure and Magnetic Properties of Fe-N Thin Films with Different DC Magnetron Sputtering Power and Time

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주제분류기계공학

초록

Due to the high saturation magnetization (~2.4 T), Fe16N2 is interesting for the thin film application such as an actuator, data record storage and sensor etc. In this study, Fe-N thin films were deposited on Si(001) substrate with various power and deposition time by DC magnetron sputtering, in order to get high portion of Fe16N2¬ phase. Surface morphology, phase formation and magnetic properties were measured. As a result, Saturation magnetization and Remanence magnetization reach to ~2.45 T and 1.41T. But, Coercivity was not enough in this experiments. Its value lower than 100 Oe. Which is very close to theoretical value.

Abstract

Due to the high saturation magnetization (~2.4 T), Fe16N2 is interesting for the thin film application such as an actuator, data record storage and sensor etc. In this study, Fe-N thin films were deposited on Si(001) substrate with various power and deposition time by DC magnetron sputtering, in order to get high portion of Fe16N2¬ phase. Surface morphology, phase formation and magnetic properties were measured. As a result, Saturation magnetization and Remanence magnetization reach to ~2.45 T and 1.41T. But, Coercivity was not enough in this experiments. Its value lower than 100 Oe. Which is very close to theoretical value.

참고문헌 (12)

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  10. Jong-Hwa Lee, "Structure and magnetic properties of Fe-N films deposited by DC magnetron sputtering", Journal of Korean Magnetics Society, 3, pp.87~93 (1993)
  11. T. K. Kim, "New Magnetic Material Having Ultrahigh Magnetic Moment", Appl. Phys. Lett, 20, pp.492~494 (1972)
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