TiO2/SiOxCy 이중 박막을 이용한 투명 친수성/내마모성 반사방지 코팅
Anti-Reflective Coating with Hydrophilic/Abraion-Resistant Properties using TiO2/SiOxCy Double-Layer Thin Film
2
조회
0
다운로드
1
인용
0
참고문헌
키워드
초록
A double-layered anti-reflective coating with hydrophilic/abrasion-resistant properties was studied using anatase titanium dioxide(TiO2) and silicon oxycarbide(SiOxCy) thin film. TiO2 and SiOxCy thin films were sequentially deposited on a glass substrate by DC sputtering and PECVD, respectively. The optical properties were measured by UV-Vis-NIR spectrophotometer. The abrasion-resistance and the hydrophilicity were observed by a taber abrasion tester and a contact angle analyzer, respectively. The TiO2/SiOxCy double-layer thin film had an average transmittance of 91.3%, which was improved by 10% in the visible light region (400 to 800 nm) than that of the TiO2 single-layer thin film. The contact angle of TiO2/SiOxCy film was 6.9° right after UV exposure. After 9 days from the exposure, the contact angle was 10.2°, which was 33° lower than that of the TiO2 single-layer film. By the abrasion test, SiOxCy film showed a superior abrasion-resistance to the TiO2 film. Consequently, the TiO2/SiOxCy double-layer film has achieved superior anti-reflection, hydrophilicity, and abrasion resistance over the TiO2 or SiOxCy single-layer film.
Abstract
A double-layered anti-reflective coating with hydrophilic/abrasion-resistant properties was studied using anatase titanium dioxide(TiO2) and silicon oxycarbide(SiOxCy) thin film. TiO2 and SiOxCy thin films were sequentially deposited on a glass substrate by DC sputtering and PECVD, respectively. The optical properties were measured by UV-Vis-NIR spectrophotometer. The abrasion-resistance and the hydrophilicity were observed by a taber abrasion tester and a contact angle analyzer, respectively. The TiO2/SiOxCy double-layer thin film had an average transmittance of 91.3%, which was improved by 10% in the visible light region (400 to 800 nm) than that of the TiO2 single-layer thin film. The contact angle of TiO2/SiOxCy film was 6.9° right after UV exposure. After 9 days from the exposure, the contact angle was 10.2°, which was 33° lower than that of the TiO2 single-layer film. By the abrasion test, SiOxCy film showed a superior abrasion-resistance to the TiO2 film. Consequently, the TiO2/SiOxCy double-layer film has achieved superior anti-reflection, hydrophilicity, and abrasion resistance over the TiO2 or SiOxCy single-layer film.
참고문헌 (16)
- M. Mazur, "TiO2", SiO2multilayer as an antireflective and protective coating deposited by microwave assisted magnetron sputtering, 2013, pp.21(2), 233~238
- Longqiang Ye, "Sol–gel preparation of SiO2", TiO2, Solar Energy Materials & Solar Cells, pp.2013, 111[DOI]
- Henning Nagel, "Optimised antireflection coatings for planar silicon solar cells using remote PECVD silicon nitride and porous silicon dioxide", Progress in PHOTOVOLATIAICS, 7(4), pp.245~260 (1999)
- D. Heřman, "Photoactivated properties of TiO2 films prepared by magnetron sputtering", Plasma Process. Polym, 4, pp.S531~S535 (2007)
- Min-Kyo Lee, "Super-hydrophilic anatase TiO2 thin film in-situ deposited by DC magnetron sputtering", Thin Solid Films, 638, pp.9~16 (2017)
- P. Zeman, "Self-cleaning and antifogging effects of TiO2 films prepared by radio frequency magnetron sputtering", J. Vac. Sci. Technol. A, 20, pp.388~ (2002)
- M. I. B. Bernardil, "TiO2 Thin Film Growth Using the MOCVD Method", Materials Research, 4(3), pp.223~226 (2001)
- V.E. Vrakatseli, "Comparative study of RF reactive magnetron sputtering and sol-gel deposition of UV induced supterhydrophilic TiOx thin films", J. Phys. Conf. Ser, 700, pp.012039~ (2016)
- S. H Nam, "Comparison of hydrophilic properties of TiO2 thin films prepared by sol-gel method and reactive magnetron sputtering system", Thin Solid Films, 519, pp.6944~6950 (2011)
- Sung-Eun Lee, "Deposition of silicon oxycarbide thin films from an organosilicon source for polycarbonate glazing", Thin Solid Films, 638, pp.354~360 (2017)
- L. Zajickova, "Characterization of silicon oxide thin films deposited by plasma enhanced chemical vapor deposition from octamethylcyclotetrasiloxane", oxygen feeds, 1999, pp.338, 49~59
- S. Permpoon, "Natural and persistent superhydrophilicity of SiO2", TiO2 and TiO2, Thin Solid Films, pp.2008, 516[DOI]
- A. Oleg, "Popov, High Density Plasma Sources:Design, Physics and Performance", pp.vii~ (1995), Noyes Publications
- Sung-Eun Lee, "Highly-conductive B-doped nc-Si:H Thin Films Deposited at Room Temperature by Using SLAN ECR-PECVD", Journal of the Korean Physical Society, 65(5), pp.651~656 (2014), 한국물리학회
- L. M. Yang, "Protective Coating by High Rate Arc Plasma Deposition, U.S. Ser. No. 09", 036,776, Filed Mar. 9, 1998, 1998
- M. M. Abd El-Raheem, "Optical properties of as-deposited TiO2 thin films prepared by DC sputtering technique", International Journal of Physical Sciences, 8(31), pp.1570~1580 (2013)