습식 공정법에 의한 초발수 TiO2 박막 제조
Fabrication of superhydrophobic TiO2 thin films by wet process
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초록
초발수 TiO2 박막을 습식 공정법에 의해 유리 기판 위에 성공적으로 제조하였다. Micro-nano 복합구조의 거친 표면을 갖는 박막을 제조하기 위하여 layer-by-layer(LBL) deposition 법과 liquid phase deposition(LPD) 법이 이용되었다. 초 발수 박막은 LBL 법에 의해 texture 구조를 갖는(PAH/PAA) 박막을 제조 한 후 그 위에 LPD 법에 의해 TiO2 나노 입자를 적층시키고 그 표면을 fluoroalkyltrimethoxysilane(FAS)를 사용하여 발수 처리를 하여 제조하였다. (PAH/PAA)10 박막의 표면 에 45분 동안 TiO2를 적층한 박막은 RMS roughness가 65.6 nm로 거친 표면을 보여주었고 발수 처리 이후에 접촉각 155 o 정도의 초발수 특성과 함께 파장 650 nm 이상에서는 80 % 이상의 투과율을 보여주었다. 서로 다른 조건에서 제조된 박막 의 표면 구조, 광학적 특성, 접촉각을 FE-SEM, AFM, UV-Vis, contact angel meter를 이용하여 측정하였다.
Abstract
Superhydrophobic TiO2 thin films were successfully fabricated on a glass substrate by wet process. Layer-bylayer (LBL) deposition and liquid phase deposition (LPD) methods were used to fabricate the thin films of micro-nano complex structure with a high roughness. To fabricate superhydrophobic TiO2 thin films, the (PAH/PAA) thin films were assembled on a glass substrate by LBL method and then TiO2 nanoparticles were deposited on the surface of (PAH/PAA) thin film by LPD method. Subsequently, hydrophobic treatment using fluoroalkyltrimethoxysilane (FAS) was carried out on the surface of prepared TiO2 thin films. The TiO2 thin film fabricated with 45 minutes immersion time on (PAH/PAA)10 showed the RMS roughness of 65.6 nm, water contact angel of 155 o and high transmittance of above 80 % (> 650 nm in wavelength) after the hydrophobic treatment. The Surface morphologies, optical properties and contact angel of prepared thin films with different experimental conditions were measured by field emission scanning electron microscope (FE-SEM), atomic force microscope (AFM), UV-Vis spectrophotometer and contact angle meter.
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