DC 펄스 마그네트론 스퍼터링으로 증착된 TiO2 박막의 특성변화에 관한 연구
Deposition Characteristics of TiO2 Thin Films Prepared by DC Pulsed Magnetron Sputtering
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This study reports a fabrication of TiO2 on the surface of dental implants by pulsed d.c. magnetron sputtering from a Ti target. A systematic investigation on the microstructure and mechanical properties of TiO2 films was carried out with the variation of O2 contents and substrate temperatures. The effects of deposition parameters on the fabricated structures were investigated by X-ray diffraction (XRD) technique and field emission scanning electron microscope (FE-SEM). Hydrophilic properties were evaluated by measuring water contact angles on the film surface. With increasing O2 contents up to 40%, surface roughness of TiO2 film increased while relatively smooth surface was obtained with 50% O2 contents. Surface roughness and adhesion strength both increased as substrate temperature increased up to 200°C. From these results, hydrophilic and adhesive properties of the present TiO2 films synthesized with 40% O2 at 200°C are regarded to be suitable for biocompatible applications.
Abstract
This study reports a fabrication of TiO2 on the surface of dental implants by pulsed d.c. magnetron sputtering from a Ti target. A systematic investigation on the microstructure and mechanical properties of TiO2 films was carried out with the variation of O2 contents and substrate temperatures. The effects of deposition parameters on the fabricated structures were investigated by X-ray diffraction (XRD) technique and field emission scanning electron microscope (FE-SEM). Hydrophilic properties were evaluated by measuring water contact angles on the film surface. With increasing O2 contents up to 40%, surface roughness of TiO2 film increased while relatively smooth surface was obtained with 50% O2 contents. Surface roughness and adhesion strength both increased as substrate temperature increased up to 200°C. From these results, hydrophilic and adhesive properties of the present TiO2 films synthesized with 40% O2 at 200°C are regarded to be suitable for biocompatible applications.
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