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열 나노임프린트 리소그래피에서의 몰드와 열가소성 폴리머 필름 사이의 응착 특성

Adhesion characteristics between mold and thermoplastic polymer film in thermal nanoimprint lithography

강지훈|김경웅|김광섭
한국트라이볼로지학회 (Korean Tribology Society)|2008.10|한국트라이볼로지학회지 (Tribology and Lubricants)|제24권 제5호|pp. 255-263

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참고문헌

키워드

Thermal nanoimprint lithography(열 나노임프린트 리소그래피)adhesion(응착)anti-sticking layer(응착방지막)thermoplastic polymer film(열가소성 폴리머 필름)
주제분류기계공학

초록

Adhesion tests were conducted to investigate the adhesion characteristics between mold and thermoplastic polymer film. Coating of anti-sticking layer (ASL), a kind of polymer material, imprint pressure, and separation velocity were considered as the process conditions. A piece of fused silica without patterns on its surface was used as a mold and the thermoplastic polymer films were made on Si substrate by spin-coating the commercial polymer solution such as mr-I PMMA and mr-I 7020. The ASL was derived from (1H, 1H, 2H, 2H -perfluorooctyl) trichlorosilane(F13-OTS) and coated on the fused silica mold in vapor phase. The pull-off force was measured in various process conditions and the surfaces of the mold and the polymer film were observed after separation. It was found that the adhesion characteristics between the mold and the thermoplastic polymer film and the release performance of ASL were changed according to the process conditions. The ASL was effective to reduce the pull-off force and the damage of polymer film. In cases of the mold coated with ASL, the pulloff force did not depend on imprint pressure and separation velocity

Abstract

Adhesion tests were conducted to investigate the adhesion characteristics between mold and thermoplastic polymer film. Coating of anti-sticking layer (ASL), a kind of polymer material, imprint pressure, and separation velocity were considered as the process conditions. A piece of fused silica without patterns on its surface was used as a mold and the thermoplastic polymer films were made on Si substrate by spin-coating the commercial polymer solution such as mr-I PMMA and mr-I 7020. The ASL was derived from (1H, 1H, 2H, 2H -perfluorooctyl) trichlorosilane(F13-OTS) and coated on the fused silica mold in vapor phase. The pull-off force was measured in various process conditions and the surfaces of the mold and the polymer film were observed after separation. It was found that the adhesion characteristics between the mold and the thermoplastic polymer film and the release performance of ASL were changed according to the process conditions. The ASL was effective to reduce the pull-off force and the damage of polymer film. In cases of the mold coated with ASL, the pulloff force did not depend on imprint pressure and separation velocity

참고문헌 (26)

  1. Chou, S. Y., "Imprint of sub-25 nm Vias and Trenches in Polymers", Appl.Phys.Lett, 67(21), pp.3114~3116 (1995)
  2. Guo.L.J, "Recent Progress in Nanoimprint Technology and its Applications", J.Phys.D:Appl.Phys, 37, pp.R123~R141 (2004)
  3. Moran, D., "Nanoimprint Lithography Process Optimization for the Fabrication of High Electron Mobility Transistors", J.Vac.Sci.Technol.B, 21(6), pp.2783~2787 (2003)
  4. Zhang, W, "Fabrication of 60-nm Transistors on 4-in.Wafer Using Nanoimprint at All Lithography Levels", Appl.Phys.Lett, 83(8), pp.1632~1634 (2003)
  5. Ye, P. D., "Formation and Characterization of Nanometer Scale Metal-oxide-semiconductor Structures on GaAs Using Low-temperature Atomic Layer Deposition", Appl.Phys.Lett, 87(1), pp.13501~13503 (2005)
  6. Puscasu, I., "Comparison of Infrared Frequency Selective Surfaces Fabricated by Direct-write Electron-beam and Bilayer Nanoimprint Lithographies", J.Vac.Sci.Technol.B, 18(6), pp.3578~3581 (2000)
  7. Ahn,S.W., "Polymeric Wavelength Filter Based on a Bragg Grating Using Nanoimprint Technique", IEEE Photon.Technol.Lett, 17(10), pp.2122~2124 (2005)
  8. Arakcheeva E. M., "Fabrication of Semiconductorand Polymer-based Photonic Crystals Using Nanoimprint Lithography", Tech.Phys, 50(8), pp.1043~1047 (2005)
  9. Cheng,X., "High-resolution Organic Polymer Light-emitting Pixels Fabricated by Imprinting Technique", J.Vac.Sci.Technol.B, 20(6), pp.2877~2880 (2002)
  10. Kao, P. C., "Fabrication of Large-scaled Organic Light Emitting Devices on the Flexible Substrates Using Low-pressure Imprinting Lithography", Elec.Dev.IEEE Transactions, 52(8), pp.1722~1726 (2005)
  11. Ahn, S. W., "Fabrication of a 50 nm Half-pitch Wire Grid Polarizer Using Nanoimprint Lithography", Nanotechnology, 16(9), pp.1874~1877 (2005)
  12. Ohtake, T., "DNA Nanopatterning with Selforganization by Using Nanoimprint", J.Vac.Sci.Technol.B, 22(6), pp.3275~3278 (2004)
  13. Bunk, R., "Guiding Molecular Motors with Nano-Imprinted Structures", Jap.J.Appl.Phys.part 1, 44(5A), pp.3337~3340 (2005)
  14. Austin, M. D., "Fabrication of 5 nm Linewidth and 14 nm Pitch Features by Nanoimprint Lithography", Appl.Phys.Lett, 84(26), pp.5299~5301 (2004)
  15. Hirai,Y., "Defect Analysis in Thermal Nanoimprint Lithography", J.Vac.Sci.Technol.B, 21(6), pp.2765~2770 (2003)
  16. Hirai, Y., "High Aspect Pattern Fabrication by Nano Imprint Lithography Using Fine Diamond Mold", Jap.J.Appl.Phys.Part 1, 42, pp.3863~3866 (2003)
  17. Jaszewski, R. W., "Properties of Thin Anti-adhesive Films Used for the Replication of Microstructures in Polymers", Microelectron.Eng, 45(1), pp.381~384 (1997)
  18. Beck,M., "Improving Stamps for 10 nm Level Wafer Scale Nanoimprint Lithography", Microelectron.Eng, 61, pp.441~448 (2002)
  19. Chen,J.K., "Effect of Fluoroalkyl Substituents on the Reactions of Alkylchlorosilanes with Mold Surfaces for Nanoimprint Lithography", J.Vac.Sci.Technol.B, 22(6), pp.3233~3241 (2004)
  20. Schift, H., "Controlled Co-evaporation of Silanes for Nanoimprint Stamps", Nanotechnology, 16, pp.S171~S175 (2005)
  21. Park, S., "Anti-adhesive Layers on Nickel Stamps for Nanoimprint Lithography", Microelectronic Eng, 73, pp.196~201 (2004)
  22. Tallal,J., "AFM Characterization of Antisticking Layers Used in Nanoimprint", Microelectron.Eng, 83, pp.851~854 (2006)
  23. Ulman,A, "Formation and Structure of Self-assembled Monolayers", Chem.Rev, 96, pp.1533~1554 (1996)
  24. Ja czuk,B., "Some Remarks on the Components of the Liquid Surface Free Energy", J.Colloid.Interface Sci, 211, pp.96~103 (1999)
  25. Kasai, T., "Micro", nanotribological Study of Perfluorosilane SAMs for Antistiction and Low Wear, 2005, pp.23(3), 995~1003
  26. Jones, Richard A.L., "Polymers at surfaces and interfaces", pp.293~293 (1999), Cambridge University

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