열-나노임프린트 공정의 점탄성 유한요소해석
A Viscoelasitc Finite Element Analysis of Thermal NanoimprintLithography Process
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초록
최근 나노임프린트 리소그래피 공정이 마이크로/나노 스케일의 소자 개발에 있어서 경제적으 로 대량 생산할 수 있는 기술로 주목 받고 있다. 나노 스케일의 패턴을 성공적으로 전사하기 위해서는 폴 리머의 기계적 거동에 대한 이해를 바탕으로, 적절한 공정 조건 즉, 압력, 온도, 시간 등의 선택이 필요하 다. 본 연구에서는 열-나노임프린트 공정에서의 충전과정을 해석하기 위하여 비선형 유한요소법을 이용 하였으며, 폴리머의 거동을 점탄성으로 가정하여 재료의 응력완화 효과를 고려하였다. 해석을 통하여 온 도 및 몰드의 패턴형상이 열-나노임프린트 공정에 미치는 영향을 살펴보았다.
Abstract
Nanoimprint lithography (NIL) is an emerging technology enabling cost-effective and high-throughput nanofabrication. To successfully imprint a nano-sized pattern, the process conditions such as temperature, pressure, and time should be appropriately selected. This starts with a clear understanding of polymer material behavior during the NIL process. In this work, the squeezing of thin polymer films into nanocavities during the thermal NIL has been investigated based upon a two-dimensional viscoelastic finite element analysis in order to understand how the process conditions affect a pattern quality. The simulations have been performed within the viscoelastic plateau region and the stress relaxation effect has been taken into account.
참고문헌 (12)
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