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감도특성 향상을 위한 국부적 표면식각 다이아프램 구조 연구

The Diaphragm Structure Using the Local Surface Etching for the Improvement of Sensitivity Characteristics

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주제분류공학일반

초록

Abstract

In the pressure sensor, about below 20 kPa, the center boss diaphragm structure is generally used, but it is hard to obtainthe high sensitivity because the center boss structure is limited at the thickness and size of diaphragm with chip size.Therefore, this paper suggests that the Center boss structure has surface etched diaphragm using a stress concentrationto improve the sensitivity. We carried out the simulation and fabrication applied new diaphragm design. In the result, thesensitivity is improved to 60% without the change of non-linearity (0.14%FS). So, the Center boss of surface etcheddiaphragm can be applied for the high sensitivity in the low-pressure sensor.

참고문헌 (5)

  1. M. Nishihara,, "Recent semiconductor pressure sensors", pp.285~
  2. J. Binder, "Silicon pressure sensors for the range 2 kPa to 40 MPa. Part 1 A chip for every pressure range", xx, pp.64~ (1985)
  3. Min-Hang Bao, "Micro mechanical transducers", pp.265~279 (2000)
  4. J. R. Mallon, "Transducers employing convoluted diaphragms" (1983)
  5. Min-Hang Bao, "Micromachined beam-diaphragm structure improves performances of pressure transducer", sensors and actuators, pp.21~23137141 (1990)

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