OLED 소자 제조를 위한 주울 가열 봉지 공정 시 도전층 구조에 따르는 열분포
Temperature Distribution According to the Structure of a Conductive Layer during Joule-heating Induced Encapsulation for Fabrication of OLED Devices
1
조회
0
다운로드
1
인용
0
참고문헌
키워드
초록
Encapsulation is required since organic materials used in OLED devices are fragile to water vapor and oxygen. Laser sealing method is currently used where IR laser is scanned along the glass-frit coated lines. Laser method is, however, not suitable to encapsulating large-sized glass substrate due to the nature of sequential scanning. In this work we propose a new method of encapsulation using Joule heating. Conductive layer is patterned along the sealing lines on which the glass frit is screen printed and sintered. Electric field is then applied to the conductive layer resulting in bonding both the panel glass and the encapsulation glass by melting glass-frit. In order to obtain uniform bonding the temperature of a conductive layer having a shape of closed loop should be uniform. In this work we conducted simulation for heat distribution according to the structure of a conductive layer used as a Joule-heat source. Uniform temperature was obtained with an error of 5% by optimizing the structure of a conductive layer. Based on the results of thermal simulations we concluded that Joule-heating induced encapsulation would be a good candidate for encapsulation method especially for large area glass substrate
Abstract
Encapsulation is required since organic materials used in OLED devices are fragile to water vapor and oxygen. Laser sealing method is currently used where IR laser is scanned along the glass-frit coated lines. Laser method is, however, not suitable to encapsulating large-sized glass substrate due to the nature of sequential scanning. In this work we propose a new method of encapsulation using Joule heating. Conductive layer is patterned along the sealing lines on which the glass frit is screen printed and sintered. Electric field is then applied to the conductive layer resulting in bonding both the panel glass and the encapsulation glass by melting glass-frit. In order to obtain uniform bonding the temperature of a conductive layer having a shape of closed loop should be uniform. In this work we conducted simulation for heat distribution according to the structure of a conductive layer used as a Joule-heat source. Uniform temperature was obtained with an error of 5% by optimizing the structure of a conductive layer. Based on the results of thermal simulations we concluded that Joule-heating induced encapsulation would be a good candidate for encapsulation method especially for large area glass substrate
참고문헌 (11)
- J. J. Lih, , SID Symp. Dig. Tech., 35, pp.1504~ (2004)
- S. F. Lim, , Appl. Phys. Lett, 78, pp.2116~ (2001)
- M. Kawaharada, , Synthetic Met, 91, pp.113~ (1997)
- "LG Chem. Ltd"[URL]
- J. Lawrence, , Opt. Laser Technol, 30, pp.205~ (1998)
- J. Lawrence, , Opt. Laser Technol, 30, pp.215~ (1998)
- J. Lawrence, , Opt. Laser Technol., 34 (2002)
- "The REMBAR Company Inc."[URL]
- 김동현, "OLED 디스플레이 제작을 위한 Joule 유도 결정화 공정에서의 유리기판에 대한 열해석", 대한기계학회논문집 B, 33(10), pp.797~802 (2009), 대한기계학회
