PECVD법에 의해 증착된 Ti-B-C 코팅막 내의 보론함량과 증착온도에 따른 미세구조 및 기계적 물성의 변화
The effect of boron content and deposition temperature on the Microstructure and mechanical property of Ti-B-C coating prepared by Plasma-enhanced chemical vapor deposition
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Abstract
Ternary Ti-B-C coatings were synthesized on WC-Co and Si wafers substrates by a PECVD technique using a gaseous mixture of TiCl4, BCl3, CH4, Ar, and H2. The effects of deposition variables such as substrate temperature, gas ratio, Rx=[BCl3/(CH4+BCl3)] on the microstructure and mechanical properties of Ti-B-C coatings were investigated. From our instrumental analyses, the synthesized Ti-B-C coatings was confirmed to be composites consisting of nanocrystallites TiC, quasi-amorphous TiB2, and amorphous carbon at low boron content, on the contrary, nanocrystallites TiB2, quasi-amorphous TiC, and amorphous carbon at relatively high boron content. The microhardness of the Ti-B-C coatings increased from ~23 GPa of TiC to ~38 GPa of Ti0.33B0.55C0.11 coatings with increasing the boron content. The Ti0.33B0.55C0.11 coatings showed lower average friction coefficient of 0.45, in addition, it showed relatively better wear behavior compared to other binary coatings of TiB2 and TiC. The microstruture and microhardness value of Ti-B-C coatings were largely depend on the deposition temperature.