반도체 산업용 STS316L 스테인리스 스틸의 전해연마 및 부동태화 공정에서 전해액 조성이 미치는 영향
The effects of electrolyte composition on the electropolishing and passivation of STS316L stainless steel for semiconductor applications
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Stainless steel used in the semiconductor industry requires high surface quality and corrosion resistance, making ultra-cleaning processes essential. This study investigated the effects of various electrolyte compositions with different ratios of phosphoric acid and sulfuric acid on the electropolishing performance and Cr/Fe ratio of stainless steel. As the phosphoric acid content increased, the optimal voltage range for maintaining stable current density narrowed, but surface roughness improved due to its oxidation-promoting effect. In contrast, higher sulfuric acid content resulted in limited improvements in surface quality and the Cr/Fe ratio. These findings present a method for optimizing electrolyte composition and passivation time to effectively enhance the surface quality and corrosion resistance of stainless steel required in the semiconductor industry.
Abstract
Stainless steel used in the semiconductor industry requires high surface quality and corrosion resistance, making ultra-cleaning processes essential. This study investigated the effects of various electrolyte compositions with different ratios of phosphoric acid and sulfuric acid on the electropolishing performance and Cr/Fe ratio of stainless steel. As the phosphoric acid content increased, the optimal voltage range for maintaining stable current density narrowed, but surface roughness improved due to its oxidation-promoting effect. In contrast, higher sulfuric acid content resulted in limited improvements in surface quality and the Cr/Fe ratio. These findings present a method for optimizing electrolyte composition and passivation time to effectively enhance the surface quality and corrosion resistance of stainless steel required in the semiconductor industry.
참고문헌 (13)
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