Deposition of (Ti, Cr, Zr)N-MoS2 Thin Films by D.C. Magnetron Sputtering
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Deposition of (Ti,Cr,Zr)N-MoS2 Thin Films by D.C. Magnetron Sputtering
Abstract
As technology advances, there is a demand for development of hard solid lubricant coating. (Ti,Cr,Zr)N-MoS2 films were deposited on AISI H13 tool steel substrate by co-deposition of MoS2 with (Ti,Cr,Zr)N using a D.C. magnetron sputtering process. The influence of the N2/Ar gas ratio, the amount of MoS2 in the films and the bias voltage on the mechanical and structural properties of the films were investigated. The highest hardness level was observed at the N2/Ar gas ratio of 0.3. Hardness of the films did not change much with the increase of the MoS2 content in the films. As the substrate bias potential was increased, hardness level of the film reached maximum at 150 V. Surface morphology of these films indicated that high hardness was attributed to the fine dome structure
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