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Deposition of (Ti,Cr)N-MoS2 Thin Films by D.C Magnetron Sputtering

J. H. Kim|김선규
한국표면공학회 (The Korean Society of Surface Science and Engineering)|2006.04|한국표면공학회지 (Journal of Surface Science and Engineering)|제39권 제2호|pp. 70-75

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참고문헌

주제분류기계공학

초록

Abstract

As technology advances, there is a demand for development of hard, solid lubricant coating. (Ti,Cr)N-MoS2 films were deposited on SKD 11 tool steel substrate by co-deposition of MoS2 with (Ti,Cr)N using a D.C. magnetron sputtering process. The influence of the N2/Ar gas ratio, the deposition temperature, the amount of MoS2 in the films, and the bias voltage on the mechanical and the structural properties of the films were investigated. Wear tests were performed on the films deposited in various conditions.

참고문헌 (13)

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관련 논문AI추천

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