Iodide/Iodine용액에서 CPU chip 분쇄물의 금 침출특성
Leaching Behavior of Gold from CPU chip Grinding Products in Iodide/Iodine Solution
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초록
요오드용액을 사용하여 노트북 인쇄회로기판 CPU chip 중에 함유된 금을 침출하는 연구를 진행하였다. 150 mesh 이하로 분쇄 된 CPU chip을 Iodide/Iodine용액에서 처리한 결과 금의 침출율은 20%로 매우 낮게 나타났다. 이와 같이 낮은 침출율의 원인은 CPU chip 분쇄과정에서 금 입자 표면에 생성된 구리 피막이 침출액과 금의 접촉을 방해하기 때문인 것으로 판단되었다. 한편, CPU chip 분쇄물을 질산용액을 사용하여 전처리 한 후 Iodide/Iodine 용액으로 침출하였을 때 금의 침출율은 약 90%으로 크게 증가하였다. 이 현상을 설명하기 위하여 침출 잔사를 EDS 및 ICP 분석을 통해 관찰한 결과, 금 입자표면에 피복되어 있는 구리의 약 80%가 질산에 의해 제거되었으며 이로 인해 금의 침출율이 향상된 것을 확인할 수 있었다.
Abstract
The leaching behavior of gold from waste CPU chip using Iodide/Iodine solution was studied. The direct leaching of gold with Iodide/Iodine solution for CPU chip under the size of 150 mesh showed leaching ratio of 20%. It was assumed that the copper film was produced on the gold particle during grinding process and the copper film prevents lodine/Iodide solution from contacting with leachable gold. Meanwhile, the extraction of gold was improved to 90% by pretreatment process with HNO3 solution. In order to explain the result, EDS and ICP analysis for the leaching residue were conducted. It was found that the copper coated on the surface of the gold particle was removed about 80% by HNO3, resulting in the increment of gold leaching rate.
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