양극산화 아크방전 처리한 티타늄 임플란트의 불소방출 특성
Characteristics of Fluoride Releasing of Anodized Titanium Implant
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초록
본 연구의 목적은 다공성의 티타늄 산화막에 불소를 처리한 결과를 평가하는 것이다. 디스크에 양극산화법을 통하여 다공성의 티타늄산화막표면을 얻은 후 불소를 처리하고 일정시간동안 Hank액에 침전을 시켰다. 양극산화를 통해 일정거칠기의 표면을 얻었으며 SEM과 XRD를 통하여 표면의 형상과 성분을 분석하였다. 생성된 표면은 빠른 표면 활성도를 보였으며, 적절한 거칠기와 좋은 골반응으로 골유착에 기여할 수 있을 것으로 여겨진다.
Abstract
The purpose of this study is to make porous oxide film on the surfaces of pure Ti through anodic spark discharge in electrolytic solution containing calcium and phosphate ions, to improve osseointergration by treating fluoride agent. In addition, it is to evaluate the fluoride modified effect on the surface. Commercial pure Ti plate with 20×10×2mm and Ti wire with a diameter of 1.5mm and a total length of 15mm were used. After making titanium oxide films converted by anodic spark discharge, anodizing was performed. Fluoride was spreaded to titanium laboratory plate and maintained for 30 minutes after anodizing breakdown. Fluoride ion discharge amount was measured per 24 hours after dipping titanium plate into saline (10ml) and sustaining 90rpm in a pyrostat. Some plates and wires were dipped in Hanks solutions for a month to examine biocompatibility using SEM and XRD. TiO2 film formed by anodic discharge technique showed great roughness and uniform pores which were 1~3 ㎛ in a diameter. Roughness of the films treated with anodic discharge after blasting were higher than the turned ones(P<0.05). Rapid surface activity was observed in the samples treated with TiF3 agent, which immersed in Hanks solution for 30 days. Taking the results into consideration, the fluoride modified implant with anodic discharge demonstrates that it makes uniformly porous oxide film on the surface of implant and properly increase roughness for osseointegration. The implants will achieve greater bone integration after short healing time by improving surface activity.
참고문헌 (18)
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