현상된 레지스트 프로파일을 이용한 레이저 직접 묘화 시스템의 에어리얼 이미지 추출에 관한 연구
Aerial Image Extraction of a Laser Direct Writing System Using Developed Resist Profile
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초록
We conducted a study to extract aerial images from a laser direct writing system by utilizing measured resist profiles. We compared the resist profile obtained after the development process with the calculated resist profile using the resist model and determined aerial images with minimal error through optimization simulations. The resist model incorporated parameters from both the Dill and Mack models obtained in prior research. The study encompassed both optimal and poor focus conditions, affirming that the resist profiles obtained through optimization simulations closely match the measured resist profiles.
Abstract
We conducted a study to extract aerial images from a laser direct writing system by utilizing measured resist profiles. We compared the resist profile obtained after the development process with the calculated resist profile using the resist model and determined aerial images with minimal error through optimization simulations. The resist model incorporated parameters from both the Dill and Mack models obtained in prior research. The study encompassed both optimal and poor focus conditions, affirming that the resist profiles obtained through optimization simulations closely match the measured resist profiles.
참고문헌 (17)
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