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ZnO 나노로드의 자외선 PL 특성 개선

UV PL property improvements of ZnO nanorods

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초록

ZnO 시드 막 위에 수열합성법으로 나노로드를 성장시켰다. 고주파 스퍼터링으로 증착한 ZnO 박막을 600 ℃에서 열처리한 후 시드 막으로 사용하였다. 성장된 ZnO 나노로드를 400 ℃ 및 800 ℃에서 열처리하였다. ZnO 나노로드의 열처리에 따른 구조적 및 광학적 특성을 고찰하였다. ZnO 나노로드를 400 ℃에서 열처리함으로써 강도가 크고 반폭치가 좁은 자외선 피크를 얻을 수 있었다.

Abstract

ZnO nanorods were grown on ZnO seed films by a hydrothermal method. The rf sputtered ZnO thin films annealed at 600 ℃ were employed as the seed films. The ZnO nanorods were annealed at 400 ℃ and 800 ℃, respectively. The structural and optical property dependence of ZnO nanorods on the annealing was studied. The UV peak showing the strong intensity and narrow FWHM was obtained from ZnO nanorods annealed at 400 ℃.

참고문헌 (7)

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