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Controlling of the heterogeniously growing GaN polycrystals using a quartz ring in the edge during the HVPE-GaN bulk growth

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초록

The outstanding characteristics of high quality GaN single crystal substrates make it possible to apply the manufacture of highbrightness light emitting diodes and power devices. However, it is very difficult to obtain high quality GaN substrate becausethe process conditions are hard to control. In order to effectively control the formation of GaN polycrystals during the bulkGaN single crystal growth by the HVPE (hydride vapor phase epitaxy) method, a quartz ring was introduced in the edge ofsubstrate. A variety of evaluating method such as high resolution X-ray diffraction, Raman spectroscopy andphotoluminescence was used in order to measure the effectiveness of the quartz ring. A secondary ion mass spectroscopy wasalso used for evaluating the variations of impurity concentration in the resulting GaN single crystal. Through the detailedinvestigations, we could confirm that the introduction of a quartz ring during the GaN single crystal growth process usingHVPE is a very effective strategy to obtain a high quality GaN single crystal.

Abstract

The outstanding characteristics of high quality GaN single crystal substrates make it possible to apply the manufacture of highbrightness light emitting diodes and power devices. However, it is very difficult to obtain high quality GaN substrate becausethe process conditions are hard to control. In order to effectively control the formation of GaN polycrystals during the bulkGaN single crystal growth by the HVPE (hydride vapor phase epitaxy) method, a quartz ring was introduced in the edge ofsubstrate. A variety of evaluating method such as high resolution X-ray diffraction, Raman spectroscopy andphotoluminescence was used in order to measure the effectiveness of the quartz ring. A secondary ion mass spectroscopy wasalso used for evaluating the variations of impurity concentration in the resulting GaN single crystal. Through the detailedinvestigations, we could confirm that the introduction of a quartz ring during the GaN single crystal growth process usingHVPE is a very effective strategy to obtain a high quality GaN single crystal.

참고문헌 (23)

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관련 논문AI추천

Crystal characteristics of bulk GaN single crystal grown by HVPE method with the increase of thicknessCheol Woo Park, Hee Ae Lee, Hyo Sang Kang, Hyun Mi Kim, Jae Hwa Park, Joo Hyung Lee, Jung Hun Lee, Kwang Bo Shim, Seong Kuk Lee, Sin Young Bang, Suk Hyun Kang청정에너지연구소 · Journal of Ceramic Processing Research2017 · 제18권 제2호Characterization of GaN thick layer grown by the HVPE: Comparison of horizontal with vertical growth박지은, 심광보, 오동근, 은종원, 이성국, 이성철, 임지훈, 정진현, 최봉근, Van Thi Ha Lai한국결정성장학회 · 한국결정성장학회지2008 · 제18권 제3호Characterizations of GaN polarity controlled by substrate using the hydride vapor phase epitaxy (HVPE)technique심광보, 오동근, 이성국, 이성철, 정진현, 최봉근, Van Thi Ha Lai한국결정성장학회 · 한국결정성장학회지2008 · 제18권 제3호HVPE 법에서의 공정변수 조절에 의한 bulk GaN 단결정의 두께 최적화강석현, 강효상, 박재화, 박철우, 방신영, 심광보, 이성국, 이정훈, 이주형, 이희애한국결정성장학회 · 한국결정성장학회지2017 · 제27권 제2호HVPE법으로 성장시킨 GaN substrate 제작과 특성 평가방신영, 심광보, 오동근, 은종원, 이성국, 정준호, 정진현, 최봉근한국결정성장학회 · 한국결정성장학회지2010 · 제20권 제4호Effect of annealing temperature on the optical properties of a bulk GaN substrate강효상, 박재화, Hee Ae Lee, Joo Hyung Lee, Nuri Oh, Seong Kuk Lee, Seung Hoon Lee, Won Il Park청정에너지연구소 · Journal of Ceramic Processing Research2020 · 제21권 제5호

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