고온 황 처리를 통해 제작한 SnS 박막의물성 연구
Study on Properties of SnS Thin Films Fabricated by High Temperature Sulfurization
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Generally, the SnS absorber fabricated by a 2-step process of annealing sputtered a metal precursor by a rapid thermal process (RTP) requires a long sulfurization time due to the low sulfurization temperature of 200℃. In this study, sulfurization was performed at a high temperature of more than 400℃ to reduce the reaction time. The properties of the SnS films according to the sulfurization time and the temperature of S-soaking were investigated. The sputtered Sn precursors had a thickness of 400 nm on a 300 nm thick Mo back contact. The sulfurization process was carried out under the sulfur-rich conditions using sulfur powders and the multiple temperature profiles, which consisted of a S-soaking process and high temperature sulfurization. The experimental variables were the substrate temperature of S-soaking (280, 320℃) and the time of sulfurization (10, 20, 30 min). The S-soaking process allowed sulfur vapor to mix sufficiently with the Sn precursor layer. The sublimation phenomenon of sulfur from SnS2 and thereby the formation of Sn2S3 and SnS phases were observed systematically according to the S-soaking temperature, while the preferred orientation and the crystallinity of SnS phase varied with the sulfurization time.
Abstract
Generally, the SnS absorber fabricated by a 2-step process of annealing sputtered a metal precursor by a rapid thermal process (RTP) requires a long sulfurization time due to the low sulfurization temperature of 200℃. In this study, sulfurization was performed at a high temperature of more than 400℃ to reduce the reaction time. The properties of the SnS films according to the sulfurization time and the temperature of S-soaking were investigated. The sputtered Sn precursors had a thickness of 400 nm on a 300 nm thick Mo back contact. The sulfurization process was carried out under the sulfur-rich conditions using sulfur powders and the multiple temperature profiles, which consisted of a S-soaking process and high temperature sulfurization. The experimental variables were the substrate temperature of S-soaking (280, 320℃) and the time of sulfurization (10, 20, 30 min). The S-soaking process allowed sulfur vapor to mix sufficiently with the Sn precursor layer. The sublimation phenomenon of sulfur from SnS2 and thereby the formation of Sn2S3 and SnS phases were observed systematically according to the S-soaking temperature, while the preferred orientation and the crystallinity of SnS phase varied with the sulfurization time.
참고문헌 (12)
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