Digital Micromirror Device와 Polygon scanner의 광학적 차이에 따른 Lithography 특성 분석

Abstract

In the early days of laser invention, it was simply used as a measuring tool, but as lasers became morecommon, they became an indispensable processing tool in the industry. Short-wavelength lasers are used to make patternson wafers used in semiconductors depending on the wavelength, such as CO2 laser, YAG laser, green laser, and UVlaser. At first, the hole of the PCB board mainly used for electronic parts was not thin and the hole size was large, soa mechanical drill was used. However, in order to realize product miniaturization and high integration, small holeprocessing lasers have become essential, and pattern exposure for small hole sizes has become essential. This paperintends to analyze the characteristics through patterns by exposing the PCB substrate through DMD and polygon scanner,which are different optical systems. Since the optical systems are different, the size of the patterns was made the same,and exposure was performed under the optimal conditions for each system. Pattern characteristics were analyzed througha 3D profiler. As a result of the analysis, there was no significant difference in line width between the two systems. However, it was confirmed that dmd had better pattern precision and polygon scanner had better productivity.