다양한 기판에 형성된 BDD 전극의 폐수처리 특성
Performance of BDD Electrodes Prepared on Various Substrates for Wastewater Treatment
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Stability and activity of boron doped diamond (BDD) electrode are key factors for water treatment. In this study, BDD electrodes were prepared on various substrates such as Nb, Si, Ti, and TiNx/Ti by hot filament chemical vapor deposition (HFCVD) method. BDD/Ti film showed the delamination between BDD and Ti substrate due to the formation of TiC layer caused by diffusion of carbon. On the other hand, BDD/TiNx/ Ti showed remarkably improved stability, compared to BDD/Ti. It was confirmed that TiNx intermediate layer act as barrier layer for diffusion of carbon. High potential window of 2.8 eV was maintained on the BDD/TiNx/Ti electrode and, better wastewater treatment capability and longer electrode working life than BDD/ Nb, BDD/Si and BDD/Ti were obtained.
Abstract
Stability and activity of boron doped diamond (BDD) electrode are key factors for water treatment. In this study, BDD electrodes were prepared on various substrates such as Nb, Si, Ti, and TiNx/Ti by hot filament chemical vapor deposition (HFCVD) method. BDD/Ti film showed the delamination between BDD and Ti substrate due to the formation of TiC layer caused by diffusion of carbon. On the other hand, BDD/TiNx/ Ti showed remarkably improved stability, compared to BDD/Ti. It was confirmed that TiNx intermediate layer act as barrier layer for diffusion of carbon. High potential window of 2.8 eV was maintained on the BDD/TiNx/Ti electrode and, better wastewater treatment capability and longer electrode working life than BDD/ Nb, BDD/Si and BDD/Ti were obtained.
참고문헌 (8)
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