High-temperature Corrosion of CrAlSiN Films in Ar/1%SO2 Gas
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Nano-multilayered Cr25.2Al19.5Si4.7N50.5 films were deposited on the steel substrate by cathodic arc plasma deposition. They were corroded at 900 oC in Ar/1%SO2 gas in order to study their corrosion behavior in sulfidizing/oxidizing environments. Despite the presence of sulfur in the gaseous environment, the corrosion was governed by oxidation, leading to formation of protective oxides such as Cr2O3 and α-Al2O3, where Si was dissolved. Iron diffused outward from the substrate to the film surface, and oxidized to Fe2O3 and Fe3O4. The films were corrosion-resistant up to 150 h owing to the formation of thin (Cr2O3 and/or α-Al2O3)-rich oxide layers. However, they failed when corroded at 900 oC for 300 h, resulting in the formation of layered oxide scales due to not only outward diffusion of Cr, Al, Si, Fe and N, but also inward movement of sulfur and oxygen.
Abstract
Nano-multilayered Cr25.2Al19.5Si4.7N50.5 films were deposited on the steel substrate by cathodic arc plasma deposition. They were corroded at 900 oC in Ar/1%SO2 gas in order to study their corrosion behavior in sulfidizing/oxidizing environments. Despite the presence of sulfur in the gaseous environment, the corrosion was governed by oxidation, leading to formation of protective oxides such as Cr2O3 and α-Al2O3, where Si was dissolved. Iron diffused outward from the substrate to the film surface, and oxidized to Fe2O3 and Fe3O4. The films were corrosion-resistant up to 150 h owing to the formation of thin (Cr2O3 and/or α-Al2O3)-rich oxide layers. However, they failed when corroded at 900 oC for 300 h, resulting in the formation of layered oxide scales due to not only outward diffusion of Cr, Al, Si, Fe and N, but also inward movement of sulfur and oxygen.
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