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Sulfamate-chloride bath에서 Co 농도의 변화에 따른 Ni-Co 필름의 특성

Property Changes of Ni-Co Film with the Change of Co Concentration in Sulfamate-chloride Bath

박덕용|윤필근
한국표면공학회 (The Korean Society of Surface Science and Engineering)|2020.02|한국표면공학회지 (Journal of Surface Science and Engineering)|제53권 제1호|pp. 1-8

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키워드

Electrodepositionthin film propertiesNi thin filmNiCo thin filmsulfamate-chloride bath
주제분류기계공학

초록

Sulfamate-chloride baths were fabricated to study the properties of the electrodeposited Ni and NiCo thin films. The dependences of current efficiency, deposit composition of Ni and Co, residual stress, surface morphology and microstructure of electrodeposited Ni and NiCo thin films on CoCl2 concentration in sulfamate-chloride baths were investigated. The current efficiency was measured to be more than about 90 %, independent of the changes of CoCl2 concentration in the baths. Residual stress of Ni and NiCo thin films was increased from about 45 to about 250 MPa with varying CoCl2 concentration from 0 to 0.210 M CoCl2 in the baths and then reached to a plateau, about 250 MPa above 0.420 M CoCl2 concentration. Nodular surface morphologies were observed at most CoCl2 concentrations in the baths except 0.210 M. NiCo thin film electrodeposited from the bath with 0.210 M CoCl2 concentration showed an acicular surface morphology. Pure Ni thin film consists of FCC(111), FCC(200), FCC(220), and FCC(311) peaks without any preferred orientation. On the other hand NiCo thin films make up of HCP(100), FCC(111), HCP(101), FCC(200), FCC(220) or HCP(110), FCC(311) or HCP(112) and FCC(222) peaks. It was revealed from the analysis of XRD result that FCC(111) peak at the NiCo thin film electrodeposited from the bath with 0.084 M CoCl2 concentration can be regarded as the preferred orientation. However the peak of the preferred orientation was changed to FCC(220) or HCP(110) above 0.084 M CoCl2 concentration in the baths. Then the intensity of FCC(220) or HCP(110) peak was gradually decreased with increasing CoCl2 concentration further. The crystalline size of pure Ni thin film was observed to be about 53 μm and those of NiCo thin films were in the range of 35~45 μm.

Abstract

Sulfamate-chloride baths were fabricated to study the properties of the electrodeposited Ni and NiCo thin films. The dependences of current efficiency, deposit composition of Ni and Co, residual stress, surface morphology and microstructure of electrodeposited Ni and NiCo thin films on CoCl2 concentration in sulfamate-chloride baths were investigated. The current efficiency was measured to be more than about 90 %, independent of the changes of CoCl2 concentration in the baths. Residual stress of Ni and NiCo thin films was increased from about 45 to about 250 MPa with varying CoCl2 concentration from 0 to 0.210 M CoCl2 in the baths and then reached to a plateau, about 250 MPa above 0.420 M CoCl2 concentration. Nodular surface morphologies were observed at most CoCl2 concentrations in the baths except 0.210 M. NiCo thin film electrodeposited from the bath with 0.210 M CoCl2 concentration showed an acicular surface morphology. Pure Ni thin film consists of FCC(111), FCC(200), FCC(220), and FCC(311) peaks without any preferred orientation. On the other hand NiCo thin films make up of HCP(100), FCC(111), HCP(101), FCC(200), FCC(220) or HCP(110), FCC(311) or HCP(112) and FCC(222) peaks. It was revealed from the analysis of XRD result that FCC(111) peak at the NiCo thin film electrodeposited from the bath with 0.084 M CoCl2 concentration can be regarded as the preferred orientation. However the peak of the preferred orientation was changed to FCC(220) or HCP(110) above 0.084 M CoCl2 concentration in the baths. Then the intensity of FCC(220) or HCP(110) peak was gradually decreased with increasing CoCl2 concentration further. The crystalline size of pure Ni thin film was observed to be about 53 μm and those of NiCo thin films were in the range of 35~45 μm.

참고문헌 (22)

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