반도체 표면처리공정용 대면적 히터 플레이트의 열전달 특성에 관한 연구
A study on the Heat Transfer characteristics of the Large Dimension Heater Plate for a Semiconductor Process
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The numerical study for the effect of various factors that affect the temperature distribution of the process glass installed above the large rectangular heater plate was carried out. For the calculation, heat flux, distance between heat source and process glass plate, effect of vacuum condition and convection in a chamber were considered as an important factors. The results showed that the temperature gradient on the glass was increased at the natural convection because of the buoyancy force increases due to the heated air. Also, the more heat flux and distance between the heater plate and glass increases, the more increasing the temperature gradient was. In the case of isothermal heating wall, the temperature variation was smaller than the uniform heat flux condition.
Abstract
The numerical study for the effect of various factors that affect the temperature distribution of the process glass installed above the large rectangular heater plate was carried out. For the calculation, heat flux, distance between heat source and process glass plate, effect of vacuum condition and convection in a chamber were considered as an important factors. The results showed that the temperature gradient on the glass was increased at the natural convection because of the buoyancy force increases due to the heated air. Also, the more heat flux and distance between the heater plate and glass increases, the more increasing the temperature gradient was. In the case of isothermal heating wall, the temperature variation was smaller than the uniform heat flux condition.
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