대기 노출된 Al6061 알루미늄 합금 산화막에 대한 미세조직 분석
Microstructural Analysis on Oxide Film of Al6061 Exposed to Atmospheric Conditions
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초록
Al6061 aluminum alloy specimens were exposed to atmospheric conditions for maximum 24 months. 24-month exposure specimen showed some more frequent and larger size of corrosion products and pitting on the surface compared with the 12-month exposure specimens. The XRD examination revealed the dominant surface oxide phases of Al2O3 and Al(OH)3. The oxide thickness at uniform oxidation (or non-pitting) region was not much changed over exposure time. The 1.2 μm deep oxygen penetration area was found in the 12-months exposed specimen near the thin uniform aluminum oxide film. The line-EDS was conducted through the penetration regions and non-penetrated grain boundary. There were signs of O and Si concentration through the penetration region, whereas non-penetration region showed no concentration of O or Si. It was confirmed that pitting is a more severe degradation mode in Al6061 (max. ＞4 μm deep) compared with the uniform oxidation (max. ~200 nm deep) up to 24-months exposure.
Abstract
Al6061 aluminum alloy specimens were exposed to atmospheric conditions for maximum 24 months. 24-month exposure specimen showed some more frequent and larger size of corrosion products and pitting on the surface compared with the 12-month exposure specimens. The XRD examination revealed the dominant surface oxide phases of Al2O3 and Al(OH)3. The oxide thickness at uniform oxidation (or non-pitting) region was not much changed over exposure time. The 1.2 μm deep oxygen penetration area was found in the 12-months exposed specimen near the thin uniform aluminum oxide film. The line-EDS was conducted through the penetration regions and non-penetrated grain boundary. There were signs of O and Si concentration through the penetration region, whereas non-penetration region showed no concentration of O or Si. It was confirmed that pitting is a more severe degradation mode in Al6061 (max. ＞4 μm deep) compared with the uniform oxidation (max. ~200 nm deep) up to 24-months exposure.
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