Preparation of Ta-doped TiO₂thin films by co-sputtering and their photoelectrode properties
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Ta-doped thin films were deposited on quartz and indium-tin oxide glass substrates using a co-sputtering method. The Ta-doped films formed a solid solution that induced structural changes from rutile to anatase phase. The anodic photocurrents of the Ta-doped TiO₂electrodes were observed not only in UV but also in the visible light range. The photocurrent response in visible light on Ta-doped TiO₂films are due to bandgap reduction.
Abstract
Ta-doped thin films were deposited on quartz and indium-tin oxide glass substrates using a co-sputtering method. The Ta-doped films formed a solid solution that induced structural changes from rutile to anatase phase. The anodic photocurrents of the Ta-doped TiO₂electrodes were observed not only in UV but also in the visible light range. The photocurrent response in visible light on Ta-doped TiO₂films are due to bandgap reduction.
참고문헌 (10)
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