에어로졸 증착법에 의한 PZT 후막의 미세구조에 미치는 PZN 첨가의 영향
Effect of PZN addition on microstructure of PZT thick films by aerosol deposition process
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초록
에어로졸 증착법에 의해서 상온에서 6 μm/min의 속도로 5~10 μm 두께의 PZT-PZN(0 %, 20 %, 40 %) 복합체의막을 실리콘/사파이어 기판위에서 제조하였다. 에어로졸 증착에 사용된 PZT, 2PZN-8PZT, 4PZN-6PZT 초기분말입자는 불규칙한 형상을 가지고 있으며 submicron 크기임을 확인하였다. 증착된 막은 어떠한 뜯김이나 기공도 없는 치밀한 막임을 확인하였고 나노크기의 입자를 가진 페로브스카이트 단상이었다. 실리콘기판 및 사파이어 기판위에서 증착된 막은 전기로에서 700oC 및 900oC에서 각각 어닐링처리 하였으며 PZT에 40 %의 PZN이 첨가된 조성의 막의 경우 pyrochlore의 2차상이형성되었다. 미세구조에 미치는 PZN 첨가의 영향을 관찰하기 위해 FE-SEM 및 HR-TEM이 사용되었다.
Abstract
Lead zinc niobate (PZN) added lead zirconate titanate (PZT) thick films with thickness of 5~10 μm were fabricated on silicon and sapphire substrates using aerosol deposition method. The contents of PZN were varied from 0 %, 20 % and 40 %. The initial particles (PZT, 2PZN-8PZT, 4PZN-6PZT) had irregular shape and submicron sizes. The asdeposited film had fairly dense microstructure without any crack, and showed only a perovskite single phase formed with nano-sized grains. The as-deposited films on silicon were annealed at the temperatures of 700 o C, and the films deposited on sapphire were annealed at 900 o C in the electrical furnace. The effects of PZN addition on the microstructural evolution were observed using by FE-SEM and HR-TEM.
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