논문KCI 등재
Optical properties of vanadium dioxide thin films on c-Al2O3 (001) substrates by in-situ RF magnetron sputtering
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초록
Vanadium oxide thin films were deposited on c-Al2O3 (001) substrate by in-situ RF magnetron sputtering. Oxygen partial pressure was adjusted to prepare thermochromic VO2 phase. X-ray diffraction patterns and scanning electron microscopy convincingly showed that plate-like V2O5 grains were changed into round-shape VO2 grains as oxygen partial pressure decreased. After the optimized deposition conditions were fixed, the effect of substrate temperature and orientation on the optical properties of VO2 thin films was analyzed.
Abstract
Vanadium oxide thin films were deposited on c-Al2O3 (001) substrate by in-situ RF magnetron sputtering. Oxygen partial pressure was adjusted to prepare thermochromic VO2 phase. X-ray diffraction patterns and scanning electron microscopy convincingly showed that plate-like V2O5 grains were changed into round-shape VO2 grains as oxygen partial pressure decreased. After the optimized deposition conditions were fixed, the effect of substrate temperature and orientation on the optical properties of VO2 thin films was analyzed.
참고문헌 (23)
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관련 논문AI추천
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