Enhancement of the Corrosion Resistance of CrN Film Deposited by Inductively Coupled Plasma Magnetron Sputtering
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Inductively coupled plasma magnetron sputtering (ICPMS) has the advantage of being able to dramaticallyimprove coating properties by increasing the plasma ionization rate and the ion bombardment effectduring deposition. Thus, this paper presents the comparative results of CrN films deposited by direct currentmagnetron sputtering (dcMS) and ICPMS systems. The structure, microstructure, and mechanical andcorrosive properties of the CrN coatings were investigated by X-ray diffractometry, scanning electronmicroscopy, nanoindentation, and corrosion-resistance measurements. The as-deposited CrN films byICPMS grew preferentially on a 200 plane compared to dcMS on a 111 plane. As a result, the films depositedby ICPMS had a very compact microstructure with high hardness. The nanoindentation hardnessreached 19.8 GPa, and 13.5 GPa by dcMS. The corrosion current density of CrN film prepared by ICPMSwas about 9.8 × 10-6 mA/cm2, which was 1/470 of 4.6 × 10-3 mA/cm2, the corrosion current density of CrNfilm prepared by dcMS.
Abstract
Inductively coupled plasma magnetron sputtering (ICPMS) has the advantage of being able to dramaticallyimprove coating properties by increasing the plasma ionization rate and the ion bombardment effectduring deposition. Thus, this paper presents the comparative results of CrN films deposited by direct currentmagnetron sputtering (dcMS) and ICPMS systems. The structure, microstructure, and mechanical andcorrosive properties of the CrN coatings were investigated by X-ray diffractometry, scanning electronmicroscopy, nanoindentation, and corrosion-resistance measurements. The as-deposited CrN films byICPMS grew preferentially on a 200 plane compared to dcMS on a 111 plane. As a result, the films depositedby ICPMS had a very compact microstructure with high hardness. The nanoindentation hardnessreached 19.8 GPa, and 13.5 GPa by dcMS. The corrosion current density of CrN film prepared by ICPMSwas about 9.8 × 10-6 mA/cm2, which was 1/470 of 4.6 × 10-3 mA/cm2, the corrosion current density of CrNfilm prepared by dcMS.
참고문헌 (16)
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