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탄성 중합체 변형을 통한 패턴 변화 특성 연구

Characterization in Contol of Pattern Gap using Elastomer Deformation

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주제분류기계공학

초록

In this study, controlling pattern gap was induced by deformation of the stretchable substrate. The pre-fabricated pattern was made by depositing an Au(gold) on the Si substrate, and PDMS(Polydimethylsiloxane) was used for the stretchable substrate in consideration of surface energy, formability, and viscoelastic characteristics. For uniform deformation of PDMS, it is manufactured in the form of a tensile specimen using a molding method. An external force is applied to the deformable substrate in the uni-axial direction using a self-manufactured JIG, and the Au thin film pattern is transferred to the substrate under tensile state. After that, the external force is removed, and the PDMS specimen is recovered to its initial state. At this time, it can be seen that the pre-fabricated pattern gap is shortened from the initial size due to the viscoelastic properties of the PDMS. As a result, it was characterized to deformation rate of the pattern gap according to elongation rate of PDMS.

Abstract

In this study, controlling pattern gap was induced by deformation of the stretchable substrate. The pre-fabricated pattern was made by depositing an Au(gold) on the Si substrate, and PDMS(Polydimethylsiloxane) was used for the stretchable substrate in consideration of surface energy, formability, and viscoelastic characteristics. For uniform deformation of PDMS, it is manufactured in the form of a tensile specimen using a molding method. An external force is applied to the deformable substrate in the uni-axial direction using a self-manufactured JIG, and the Au thin film pattern is transferred to the substrate under tensile state. After that, the external force is removed, and the PDMS specimen is recovered to its initial state. At this time, it can be seen that the pre-fabricated pattern gap is shortened from the initial size due to the viscoelastic properties of the PDMS. As a result, it was characterized to deformation rate of the pattern gap according to elongation rate of PDMS.

참고문헌 (17)

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