Structural and electrical properties of K(Ta0.62Nb0.38)O3/BiFeO3 multilayer films for electrocaloric devices
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KTN/BFO multilayer films were manufactured using the spin-coating method on Pt/Ti/SiO2/Si substrate with KTN(62/38) andBFO metal alkoxide solutions. The mean thickness of the multilayer films was about 420-450 nm. A rough interfacial layerwas observed at the interface between the lower substrate and the film when sintered at 650oC. Dense microstructures withoutpores inside of the films were shown via TEM analysis, and an interface between the KTN and BFO layers was clearlyobserved. The Curie temperature was about 16oC. Dielectric constant and dielectric loss were 1380 and 0.384 at 20oC,respectively. Coercive field of the 2-layer and 6-layer films were 72.6 and 80.4 kV/cm at room temperature, respectively. ΔTand EC coefficient of the 6-layer films sintered at 630oC were 1.96oC and 0.13×10-6 oCmV-1, respectively.
Abstract
KTN/BFO multilayer films were manufactured using the spin-coating method on Pt/Ti/SiO2/Si substrate with KTN(62/38) andBFO metal alkoxide solutions. The mean thickness of the multilayer films was about 420-450 nm. A rough interfacial layerwas observed at the interface between the lower substrate and the film when sintered at 650oC. Dense microstructures withoutpores inside of the films were shown via TEM analysis, and an interface between the KTN and BFO layers was clearlyobserved. The Curie temperature was about 16oC. Dielectric constant and dielectric loss were 1380 and 0.384 at 20oC,respectively. Coercive field of the 2-layer and 6-layer films were 72.6 and 80.4 kV/cm at room temperature, respectively. ΔTand EC coefficient of the 6-layer films sintered at 630oC were 1.96oC and 0.13×10-6 oCmV-1, respectively.
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