Structural and electrical properties of potassium tantalate niobate heterolayer thin films prepared by chemical solution deposition method
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In this study, K(Ta0.65Nb0.35)O3/K(Ta0.50Nb0.50)O3 heterolayer films were fabricated by the chemical solution deposition andspin-coating method and their structural and electrical properties were measured. All specimens represented a pseudo-cubicstructure with a lattice constant of approximately 0.3999-0.4003 nm along with an observable K-deficient Ta2O5∙n(KTaO3)pyrochlore phase. Average thickness for a single coating was about 60~70 nm and average grain size was approximately 105-110 nm. Curie temperature was about 7oC and no dependence was observed on the number of coatings and sinteringatmosphere. Remanent polarization of KTN heterolayer films decreased abruptly at about 50oC. The 6-coated KTNheterolayer film sintered in O2 atmosphere showed good ΔT of 1.93oC at about 60oC and ΔT/ΔE of 0.15×10-6 KmV-1.
Abstract
In this study, K(Ta0.65Nb0.35)O3/K(Ta0.50Nb0.50)O3 heterolayer films were fabricated by the chemical solution deposition andspin-coating method and their structural and electrical properties were measured. All specimens represented a pseudo-cubicstructure with a lattice constant of approximately 0.3999-0.4003 nm along with an observable K-deficient Ta2O5∙n(KTaO3)pyrochlore phase. Average thickness for a single coating was about 60~70 nm and average grain size was approximately 105-110 nm. Curie temperature was about 7oC and no dependence was observed on the number of coatings and sinteringatmosphere. Remanent polarization of KTN heterolayer films decreased abruptly at about 50oC. The 6-coated KTNheterolayer film sintered in O2 atmosphere showed good ΔT of 1.93oC at about 60oC and ΔT/ΔE of 0.15×10-6 KmV-1.
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