염소 또는 오존을 이용한 항생제 내성 유전오염물질 제어
The Antibiotic Resistant Gene Pollutant Controls using Chlorine or Ozone disinfection
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본 연구의 목적은 다제 항생제 내성특성을 가진 pB10을 함유한 Escherichia coli DH 5 alpha,(E.coli DH5α)를 대상 미생물로 하여 염소와 오존의 살균효율을 비교하는 것이다. 또한 다제 내성플라스미드 pB10에 대한 염소와 오존에 의한 제거율을 조사하였다. 주입농도 대비 오존살균이 염소살균에 비해 약 1.2~1.4 배 정도 효율이 높게 나타났다. 또한 다제 내성플라스미드 pB10에 대한 제거 실험에서 오존에 의한 제거율이 염소보다 약 2~4배 높게 나타났다. 오존살균에 의한 높은 pB10 제거효율은 오존 살균시 발생하는 OH․ 라디칼에 의한 것으로 사료된다. 이러한 연구결과로부터 내성균 및 유전물질을 효과적으로 제어하기 위하여 기존 염소살균법에 오존 또는 광촉매산화와 같은 고급산화법을 연계처리에 대한 필요가 있을 것으로 판단된다.
Abstract
The aim of this study was to examine ozonation disinfection efficiency for Escherichia coli DH5alpha removal, containing the multi-resistance plasmid pB10 as well as chlorination disinfection efficiency. In addition,plasmid pB10 removal rates were estimated by ozonation and chlorination. The removal efficiency of pB10 via ozonation was about 2 to 4 times higher than chlorination. High removal efficiency of pB10 is likely due to OH·radical produced during ozonation. These results suggest that integration of advanced oxidation process such as ozonation (or photocatalytic oxidation) with conventional disinfection such as chlorination may be needed for effective control of antibiotic resistant bacteria and genetic materials.
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