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Hg 분위기 열처리에 따른 적외선 감지용 Hg0.7Cd0.3Te 박막의구조적 특성 변화

Effect of Hg-ambient annealing on Hg0.7Cd0.3Te thin films for IR detector

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주제분류공학일반

초록

The liquid phase epitaxy(LPE) method was widely used to growth of mercury cadmium telluride(MCT) thin films. However, this method lead to Hg-vacancies in MCT thin film, because Hg has high vapor pressure at this temperature range. This is a well known defect in HgCdTe grown by LPE method. In this study, we report the development of techniques for improving the crystalline quality and controlling the composite uniformity of HgCdTe thin films using high- pressure Hg-ambient annealing method. As a result, we achieved the improvement of the composite uniformity of HgCdTe thin films. It was observed by the high angle annular dark field scanning TEM(HAADF-STEM) analysis. Moreover, new HgTe phase and a shrinking of lattice fringe were observed.

Abstract

The liquid phase epitaxy(LPE) method was widely used to growth of mercury cadmium telluride(MCT) thin films. However, this method lead to Hg-vacancies in MCT thin film, because Hg has high vapor pressure at this temperature range. This is a well known defect in HgCdTe grown by LPE method. In this study, we report the development of techniques for improving the crystalline quality and controlling the composite uniformity of HgCdTe thin films using high- pressure Hg-ambient annealing method. As a result, we achieved the improvement of the composite uniformity of HgCdTe thin films. It was observed by the high angle annular dark field scanning TEM(HAADF-STEM) analysis. Moreover, new HgTe phase and a shrinking of lattice fringe were observed.

참고문헌 (11)

  1. T. J. de Lyon, "MBE growth of HgCdTe on silicon substrates for large-area infrared focal plane arrays:A review of recent progress", J. Electron. Mater, 28, pp.705~ (1999)
  2. K. D. Maranowski, "MBE growth of HgCdTe on silicon substrates for large format MWIR focal plane arrays", J. Electron. Mater, 30, pp.619~ (2001)
  3. R. Ashokan, "Variable area MWIR diodes on HgCdTe", Si grown by molecular beam epitaxy, 2000, pp.29, 636~
  4. G. J. Hails, J. E, "The role of surface adsorbates in the metalorganic vapor phase epitaxial growth of(Hg,Cd)Te onto(100)GaAs substrates", J. Eletronic Mater, 24, pp.1149~ (1995)
  5. S.-H. Suh, "Metalorganic vapor phase epitaxial growth of hillock free(100)HgCdTe", GaAs with good electrical properties, 1996, pp.159, 1132~
  6. O. V. Shcheritsa, "Numerical study for diffusion processes in dissolution and growth of CdxHg1-xTe=CdTe heterostructures formed by LPE.Part II.Effect of programmed temperature changes", J. Crystal Growth, 290, pp.357~ (2006)
  7. P. Moskvin, "Thermodynamic description of CdXHg1XTe growth process by LPE", J. non-cryst.solids, 354, pp.4407~ (2008)
  8. W. J. Everson, "Etch pit characterization of CdTe and CdZnTe substrates for use in Mercury Cadmium Telluride epitaxy", J. Electron. Mater, 24, pp.505~ (1995)
  9. A.Rogalski, "HgCdTe infrared detector material:history,status and outlook", Rep. Prog. Phys, 68, pp.2267~ (2005)
  10. 김진상, "GaAs 및 CdZnTe 기판위에 MOVPE 법으로 성장된 HgCdTe 박막의 특성", 한국결정학회지, 12, pp.171~ (2001)
  11. 김진상, "MBE법으로 성장된 CdTe(211)", Si 기판을 이용한 MOVPE HgCdTe 박막의 특성 향상, 2003, pp.12(6), 7~[DOI]

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