ZnO/Ag Multilayer의 투과율과 전도성에 관한 연구
The Study of Transmittance and Conductivity in ZnO/Ag Multilayer Films
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초록
This study has lowered the specific resistance by coating a thin film layer of Ag, playing the role of the electron donor on the ZnO that is used usefully for the transparent conductive oxides. Presently, this study has examined the transmittance and electric characteristics according to the thickness of the Ag thin film layer. Also, this study has observed the transmittance and electric characteristics according to the uppermost ZnO thin film layer of ZnO/Ag/ZnO symmetric film and has conducted the theoretical investigation. In order to observe the transmittance and electric characteristics according to the thickness of the Ag thin film layer and the uppermost ZnO thin film layer, this study conducted the film deposition at room temperature while making use of the DC magnetron sputtering system. In order to see the changes in the thickness of the Ag thin film layer, this study coated a thin film while increasing by 4nm; and, in order to see the changes in the thickness of uppermost ZnO thin film layer, it performed the thin film coating by increasing by 5nm. From the experimental result, the researchers observed that the best transmittance could be obtained when the thickness of the Ag thin film layer was 8nm, but the resistance and mobility increased as the thickness got larger. On the other hand, when the thickness of the uppermost ZnO thin film layer was 20nm, the experiment yielded the best transmittance with excellent electric characteristics. Also, when compared the ZnO/Ag asymmetric film with the ZnO/Ag/ZnO symmetric film, the ZnO/Ag asymmetric film showed better transmittance and electric characteristics.
Abstract
This study has lowered the specific resistance by coating a thin film layer of Ag, playing the role of the electron donor on the ZnO that is used usefully for the transparent conductive oxides. Presently, this study has examined the transmittance and electric characteristics according to the thickness of the Ag thin film layer. Also, this study has observed the transmittance and electric characteristics according to the uppermost ZnO thin film layer of ZnO/Ag/ZnO symmetric film and has conducted the theoretical investigation. In order to observe the transmittance and electric characteristics according to the thickness of the Ag thin film layer and the uppermost ZnO thin film layer, this study conducted the film deposition at room temperature while making use of the DC magnetron sputtering system. In order to see the changes in the thickness of the Ag thin film layer, this study coated a thin film while increasing by 4nm; and, in order to see the changes in the thickness of uppermost ZnO thin film layer, it performed the thin film coating by increasing by 5nm. From the experimental result, the researchers observed that the best transmittance could be obtained when the thickness of the Ag thin film layer was 8nm, but the resistance and mobility increased as the thickness got larger. On the other hand, when the thickness of the uppermost ZnO thin film layer was 20nm, the experiment yielded the best transmittance with excellent electric characteristics. Also, when compared the ZnO/Ag asymmetric film with the ZnO/Ag/ZnO symmetric film, the ZnO/Ag asymmetric film showed better transmittance and electric characteristics.
참고문헌 (12)
- 류상, "R.F Sputtering으로 제조한 ZnO박막의 미세구조와 광학적 특성에 미치는 잔류응력의 영향", 한국표면공학회지, 38(4), pp.144~149 (2005), 한국표면공학회
- 박성순, "ZnO 박막과 금속전극과의 계 면특성조사", 한국진공학회지, 7(3), pp.201~207 (1998)
- 조신호, "산소 유량비 변화에 따른 Al 도핑된 ZnO 박막의 구조 및 광학적 특성", 한국진공학회지, 16(4), pp.267~272 (2007), 한국진공학회
- 임유승, "FTS법으로 제작한 Ag", ZnO 박막의 전기적, 광학적 특성, 2008, pp.17(2), 102~108[DOI]
- 최병호, "RF Sputter 방법으로 제조한 ZnO : Ga 박막의 열처리 특성", 한국연구재단, 기초과학연구사업 학 술기사, ~ (1991)
- David, F, "LED Technology: Organic Displays Come of Age", NaturePhotonics, 3, pp.453~455 (2009)
- David, T, "Electrooptical and Structural Properties of Thin ZnO Films,Prepared by Filtered Vacuum arc Deposition", pp.61~67 (2004), Thin Solid Films
- Joseph, M.C, "Charge Rearrangement in the GexPb1−x", Ge(111) Interface, 1998, 457~463
- Kim, J.Y, "Electrical Properties of Al-doped ZnO Transparent Conducting Thin Films Deposited by RF Magnetron Sputtering", Korean Journal of Materials Research, pp.280~287 (1995)
- Yasuhrio, I, "Argon Gas Pressure Dependence of the Properties of Transparent Conducting ZnO : Al Films Deposited on Glass Substrates", Applied Surface Science, pp.508~511 (2001)
- Ladebeck, J, "Fatty Methyl Ester Hydrogenation:Application of Chromium Free Catalysts", Applied Surface Science, pp.215~220 (1999)
- Wang, P, "Effect of Process Parameters on Electrical, Optical Properties of IZO Films Produced by Inclination Opposite Target Type DC Magnetron Sputtering", J. App. Phys, 106, pp.103~104 (2009)