Mechanical and Structural Behaviors of HfN Thin Films Fabricated by Direct Current and Mid-frequency Magnetron Sputtering
0
조회
0
다운로드
1
인용
0
참고문헌
키워드
초록
Hafnium nitride (HfN) thin films were fabricated by mid-frequency magnetron sputtering (mfMS) and direct current magnetron sputtering (dcMS) and their mechanical and structural properties were compared. In particular, changes in the HfN film properties were observed by changing the pulse frequency of mfMS between 5 kHz, 15 kHz, and 30 kHz. The crystalline structure, microstructure, 3D morphology, and mechanical properties of the HfN films were compared by x-ray diffraction, field-emission scanning electron microscopy, atomic force microscopy, and nanoindentation tester, respectively. HfN film deposited by mfMS showed a smoother and denser microstructure as the frequency increased, whereas the film deposited by dcMS showed a rough and sloppy microstructure. A single δ-HfN phase was observed in the HfN film made by mfMS with a pulse frequency of 30 kHz, but mixed δ-HfN and HfN0·4 phases were observed in the HfN film made by dcMS. The mechanical properties of HfN film made by mfMS were improved compared to film made by dcMS.
Abstract
Hafnium nitride (HfN) thin films were fabricated by mid-frequency magnetron sputtering (mfMS) and direct current magnetron sputtering (dcMS) and their mechanical and structural properties were compared. In particular, changes in the HfN film properties were observed by changing the pulse frequency of mfMS between 5 kHz, 15 kHz, and 30 kHz. The crystalline structure, microstructure, 3D morphology, and mechanical properties of the HfN films were compared by x-ray diffraction, field-emission scanning electron microscopy, atomic force microscopy, and nanoindentation tester, respectively. HfN film deposited by mfMS showed a smoother and denser microstructure as the frequency increased, whereas the film deposited by dcMS showed a rough and sloppy microstructure. A single δ-HfN phase was observed in the HfN film made by mfMS with a pulse frequency of 30 kHz, but mixed δ-HfN and HfN0·4 phases were observed in the HfN film made by dcMS. The mechanical properties of HfN film made by mfMS were improved compared to film made by dcMS.
참고문헌 (17)
- Sung-Yong Chun, "Enhancement of the Corrosion Resistance of CrN Film Deposited by Inductively Coupled Plasma Magnetron Sputtering", CORROSION SCIENCE AND TECHNOLOGY, 20(3), pp.112~117 (2021), 한국부식방식학회[DOI]
- 박상원, "DC 스퍼터법과 비대칭 양극성 펄스 스퍼터법으로 제작된 고분자 전해질 연료전지 금속분리판용 CrN 코팅막의 특성 연구", 한국세라믹학회지, 50(6), pp.390~395 (2013), 한국세라믹학회
- 전성용, "듀티 싸이클 및 펄스 주파수가 TiAlN 코팅막의 미세구조와 기계적 특성에미치는 영향에 관한 연구", 한국세라믹학회지, 51(5), pp.447~452 (2014), 한국세라믹학회[DOI]
- Yu-Siang Fang, "Reactive Sputtering Deposition of Epitaxial TiC Film on Si (100) Substrate", Coatings, 10(7), pp.647~ (2020), MDPI AG[DOI]
- R. Armitage, "Lattice-matched HfN buffer layers for epitaxy of GaN on Si", Applied Physics Letters, 81(8), pp.1450~1452 (2002), AIP Publishing[DOI]
- James J. Oakes, "A comparative evaluation of HfN, Al2O3, TiC and TiN coatings on cemented carbide tools", Thin Solid Films, 107(2), pp.159~165 (1983), Elsevier BV[DOI]
- Xing-Min Cai, "Field electron emission from HfNxOy thin films deposited by direct current sputtering", Applied Surface Science, 254(10), pp.3074~3077 (2008), Elsevier BV[DOI]
- Ioannis E. Fragkos, "Surface Plasmon Coupling in GaN:Eu Light Emitters with Metal-Nitrides", Scientific Reports, 8(1), pp.13365~ (2018), Springer Science and Business Media LLC[DOI]
- Shuyong Tan, "Comparison of chromium nitride coatings deposited by DC and RF magnetron sputtering", Thin Solid Films, 519(7), pp.2116~2120 (2011), Elsevier BV[DOI]
- R.D. Arnell, "Recent developments in pulsed magnetron sputtering", Surface and Coatings Technology, 188-189, pp.158~163 (2004), Elsevier BV[DOI]
- R. Nowak, "Surface deformation and electrical properties of HfN thin films deposited by reactive sputtering", Materials Science and Engineering: A, 202(1-2), pp.226~237 (1995), Elsevier BV[DOI]
- Bing H. Hwang, "An XRD study of highly textured HfN films", Thin Solid Films, 304(1-2), pp.286~293 (1997), Elsevier BV[DOI]
- Wolfgang Tillmann, "Structure and mechanical properties of hafnium nitride films deposited by direct current, mid-frequency, and high-power impulse magnetron sputtering", Thin Solid Films, 669, pp.65~71 (2019), Elsevier BV[DOI]
- B. D. Cullity, "Elements of X-Ray Diffraction", pp.167~171 (2001), Prentice-Hall Inc
- I. Petrov, "Microstructural evolution during film growth", Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 21(5), pp.S117~S128 (2003), American Vacuum Society[DOI]
- D. Ö. Thorsteinsson, "Growth of HfN thin films by reactive high power impulse magnetron sputtering", AIP Advances, 8(3), pp.035124~ (2018), AIP Publishing[DOI]
- Jianliang Lin, "Structure and properties of uranium oxide thin films deposited by pulsed dc magnetron sputtering", Applied Surface Science, 301, pp.475~480 (2014), Elsevier BV[DOI]