극압 임프린트 리소그래피를 통한 자성고무 복합재 표면 미세 패터닝 기술
Surface Nano-to-Micro Patterning for Rubber Magnet Composite via Extreme Pressure Imprint Lithography
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초록
나노임프린트 리소그래피(Nanoimprint lithography, NIL)는 저렴한 공정비용으로 고해상도 패턴을 제조할 수있는 장점을 가지고 있기 때문에 마이크로 크기부터 나노스케일까지 패턴을 형성하는데 많이 사용되고 있다. 그러나, 대부분의 NIL 공정 기술은 기본적으로 임프린트용 레지스트 사용이 필요하고, 자외선, 열과 같은 외적인 요소 또한 필요로하기 때문에, 타겟 소재를 패터닝하기 위해서 식각공정 또는 금속 증착 등의 추가적인 후공정이 요구된다. 그리고, 유연필름이나 굴곡이 있는 소재를 패터닝 하기에 어려움이 있다. 본 연구에서는, 유연한 자성고무 복합재(rubber magnet composite, RMC) 기판 표면에 마이크로/나노 수준의 패턴을 상온에서 식각 공정 없이 형성할 수 있는 극압 임프린트 리소그래피(extreme pressure imprint lithography, EPIL) 공정을 소개하고자 한다. EPIL 기술은 금속, 고분자, 세라믹과 같은 다양한 재료의 표면에 직접적이고 영구적인 변형을 통해 초미세 구조물을 대면적으로 형성할 수 있는 공정으로서, 본연구에서는 RMC 필름에 적용하여 서브 마이크로 크기의 패턴 형성이 가능함을 보여준다. 우리는 스트론튬계 페라이트와 염소화폴리에틸렌으로 구성된 유연한 RMC 기판 표면에 마이크로/나노 스케일의 다양한 패턴 크기 및 형상을 갖는 균일한 구조물을 형성할 수 있는 공정 및 결과물을 보여주고자 한다. RMC 필름 표면 상 미세한 패턴구현이 가능한 EPIL 공정은 미세한 자기 방향의 변화 및 제어를 요구하는 첨단 전자기소자 부품 제조에 널리 적용될 수 있을 것으로 기대한다.
Abstract
Nanoimprint lithography (NIL) is widely used to form structures ranging from micro to nanoscale due to its advantage of generating high-resolution patterns at a low process cost. However, most NIL processes require the use of imprint resists and external elements such as ultraviolet light or heat, necessitating additional post-processes like etching or metal deposition to pattern the target material. Furthermore, patterning on flexible and/or non-planar films presents significant challenges. This study introduces an extreme pressure imprint lithography (EPIL) process that can form micro- /nano-scale patterns on the surface of a flexible rubber magnet composite (RMC) film at room temperature without an etching process. The EPIL technique can form ultrafine structures over large areas through the plastic deformation of various materials, including metals, polymers, and ceramics. In this study, we demonstrate the process and outcomes of creating a variety of periodic structures with diverse pattern sizes and shapes on the surface of a flexible RMC composed of strontium ferrite and chlorinated polyethylene. The EPIL process, which allows for the precise patterning on the surface of RMC materials, is expected to find broad applications in the production of advanced electromagnetic device components that require fine control and changes in magnetic orientation.
참고문헌 (21)
- M. -F. Chen, "Laser direct write patterning technique of indium tin oxide film", Thin Solid Films, 515(24), pp.8515~8518 (2007)
- B. Z hou, "Development of Flexible Rare Earth–Fe–B Rubber Magnets toward Efficient Utilization of Ce, La, and Y Elements", Advanced Engineering Materials, 25(23), pp.2301329~ (2023)
- J. Kruželák, "Magnetic composites prepared by incorporation of strontium ferrite into polar and non-polar rubber matrices", Polymer Composites, 38(11), pp.2480~2487 (2017)
- R. Sýkora, "Rubber composite materials with the effects of electromagnetic shielding", Polymer Composites, 37(10), pp.2933~2939 (2016)
- M. Przybylski, "Magnetic and mechanical properties of strontium ferrite and Nd–Fe–B rubber bonded permanent magnets", Acta Phys. Pol. A, 136(5), pp.685~688 (2019)
- M. H. Makled, "Magnetic and dynamic mechanical properties of barium ferrite–natural rubber composites", Journal of Materials Processing Technology, 160(2), pp.229~233 (2005)
- I. Kong, "Magnetic and microwave absorbing properties of magnetite–thermoplastic natural rubber nanocomposites", Journal of Magnetism and Magnetic Materials, 322(21), pp.3401~3409 (2010)
- D. S. Esteves, "Development of MWCNT", Magnetite flexible triboelectric sensors by magnetic patterning, 2023, pp.15(13), 2870~
- S. Pattipaka, "A nanoscale surface engineered magneto-mechano-triboelectric nanogenerator enabled by reliable pattern replication for self-powered IoT devices", Sustainable Energy & Fuels, 8(3), pp.649~656 (2024)
- J. Miyazaki, "EUV lithography technology for highvolume production of semiconductor devices", Journal of Photopolymer Science and Technology, 32(2), pp.195~201 (2019)
- M. Modaresialam, "Nanoimprint lithography processing of inorganicbased materials", Chemistry of Materials, 33(14), pp.5464~5482 (2021)
- Y. Wang, "Direct wavelength-selective optical and electron-beam lithography of functional inorganic nanomaterials", ACS nano, 13(12), pp.13917~13931 (2019)
- K. D. Ahn, "Fabrication of Fluorescent Oxygen Sensor Probe Module Based on Planner Lightwave Circuits using UV Imprint Lithography", Journal of the Microelectronics and Packaging Society, 25(3), pp.37~41 (2018)
- T. W. Park, "Room Temperature Imprint Lithography for Surface Patterning of Al Foils and Plates", Journal of the Microelectronics and Packaging Society, 30(2), pp.65~70 (2023)
- M. C. McAlpine, "Nanoimprint lithography for hybrid plastic electronics", Nano Letters, 3(4), pp.443~445 (2003)
- M. Meier, "Nanoimprint for future non-volatile memory and logic devices", Microelectronic engineering, 85(5-6), pp.870~872 (2008)
- S. H. Lim, "Flexible palladium-based H2 sensor with fast response and low leakage detection by nanoimprint lithography", ACS Applied Materials & Interfaces, 5(15), pp.7274~7281 (2013)
- S. Barcelo, "Nanoimprint lithography for nanodevice fabrication", Nano Convergence, 3(21), pp.1~9 (2016)
- J. W. Yi, "A Study on the Surface and Manufacturing Method of Nanostructure for Amplification of Plasmonic Phenomena of Nanoparticles", J. Microelectron. Packag. Soc, 29(1), pp.55~59 (2022)
- M. J. Haslinger, "Development of a soft UV-NIL step&repeat and lift-off process chain for high speed metal nanomesh fabrication", Nanotechnology, 31(34), pp.345301~ (2020)
- N. Unno, "Thermal nanoimprint lithography—A review of the process, mold fabrication, and material", Nanomaterials, 13(14), pp.2031~ (2023)