나노 입자의 플라즈모닉 현상 증폭을 위한 나노구조 표면과 제작방법에 관한 연구
A Study on the Surface and Manufacturing Method of Nanostructure for Amplification of Plasmonic Phenomena of Nanoparticles
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초록
본 논문에서는 플라즈몬 공명 현상을 통하여 나노 입자 주변의 전기장을 증폭시키며, 흡광률을 높일 수 있는구조를 시간영역 유한차분(FDTD)시뮬레이션을 이용하여 나노입자를 평면에 배열하였을 때와 비교하여 나노 구조에 배열하였을 때의 전기장과 흡광도를 비교하였다. 또한 나노구조의 폭을 240 nm ~ 300 nm로 조절하여 입자간의 간격이 좁을수록 광 흡수율이 높음을 보이고자 하였다. 또한 UV 임프린트를 통하여 나노 입자와 나노 구조를 표면에 함께 형성시키는 방법에 대한 연구를 진행하였다. 해당 구조에 입자를 형성하기 위하여 스프레이 코팅을 이용하여 나노 입자를 구조제작에 사용되는 몰드에 먼저 배열한 후, UV 임프린팅을 통해 제작하였고 나노구조와 입자가 함께 형성됨을 Scanning Electron Microscopy 로 확인하였다.
Abstract
In this paper, we compared the electric field and absorptance of nano particles in nanostructures by amplifying the electric field around the nanoparticles through plasmon resonance and comparing the structure that can increase the absorptance with the nanostructure by using the Finite Different Time Domain (FDTD) simulation. In addition, the width of the nanostructure was adjusted to 240 nm ~ 300 nm, and the light absorptance rate was higher as the gap between the particles was short. In addition, a study was conducted on the formation of nanoparticles and nanostructures on the surface through UV imprint. In order to form particles in the structure, the nano particles were first arranged in the mold used for the fabrication of the structure using spray coating, and then fabricated through UV imprinting. The nanostructure and particles were formed together by scanning electron microscopy.
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