펄스 마그네트론 스퍼터링 음극의 열전달 해석
Heat transfer analysis of a pulse magnetron sputtering cathode
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3-dimensional numerical analysis for a rectangular magnetron cathode model is done to predict cooling characteristics of high power sputtering system for ZnO deposition. It includes cooling channel design, heat transfer analysis of a target, bonding layer and backing plate. In order to model erosion profiles of a target, ion current density distribution from 3D Monte Carlo simulation is used to distribute total sputtering power to 5 discrete regions. At 3 kW of sputtering power and cooling water flow of 1 liter/min at 10℃, the maximum surface temperature was 45.8℃ for a flat new target and 156℃ for a target eroded by 1/3 of its thickness, respectively.
Abstract
3-dimensional numerical analysis for a rectangular magnetron cathode model is done to predict cooling characteristics of high power sputtering system for ZnO deposition. It includes cooling channel design, heat transfer analysis of a target, bonding layer and backing plate. In order to model erosion profiles of a target, ion current density distribution from 3D Monte Carlo simulation is used to distribute total sputtering power to 5 discrete regions. At 3 kW of sputtering power and cooling water flow of 1 liter/min at 10℃, the maximum surface temperature was 45.8℃ for a flat new target and 156℃ for a target eroded by 1/3 of its thickness, respectively.
참고문헌 (6)
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