반응성 증착용 펄스 플라즈마 공정의 진단
A Diagnostic Study of Pulsed Plasma Process for Reactive Deposition
2
조회
0
다운로드
0
인용
0
참고문헌
키워드
초록
A real-time monitoring of an immersed antenna type inductively coupled plasma (ICP) was done with optical emission spectroscopy (OES) to check the reports that sputtered atom density is decreasing as the ICP power is increased1,2). At 10 mTorr pressure of Ar, Mg was sputtered by a bipolar pulsed power supply into 2 MHz ICP which has an insulator covered 2.5 turn antenna. Emitted light was collected in two different positions: above the target and inside the ICP region. With 100 W of Mg sputtering power, the intensities of Mg I (285.06 nm), Mg II (279.48 nm), Ar I (420.1 nm) were increased constantly with ICP power from 100 W to 600 W. At 500 W, the intensity of Mg+ exceeded that of Mg under PID controlled discharge voltage of 180 V. The ratio of Mg II/Mg I was increased from 0.45 to 2.71 approximately 6 times.
Abstract
A real-time monitoring of an immersed antenna type inductively coupled plasma (ICP) was done with optical emission spectroscopy (OES) to check the reports that sputtered atom density is decreasing as the ICP power is increased1,2). At 10 mTorr pressure of Ar, Mg was sputtered by a bipolar pulsed power supply into 2 MHz ICP which has an insulator covered 2.5 turn antenna. Emitted light was collected in two different positions: above the target and inside the ICP region. With 100 W of Mg sputtering power, the intensities of Mg I (285.06 nm), Mg II (279.48 nm), Ar I (420.1 nm) were increased constantly with ICP power from 100 W to 600 W. At 500 W, the intensity of Mg+ exceeded that of Mg under PID controlled discharge voltage of 180 V. The ratio of Mg II/Mg I was increased from 0.45 to 2.71 approximately 6 times.
참고문헌 (9)
- Y. Matsuda, , Thin Solid Films, 475, pp.113~ (2004)
- J. C. Imbert, , 9th International Conference on Plasma Surface Engineering, pp.427~ (2004)
- O. Leroy, , J. Vac. Sci. Technol. A, 22, pp.192~ (2004)
- 김선호, "유도결합 플라즈마 마그네트론 스퍼터링에 의한 MgO 박막의 특성연구", 한국표면공학회지, 37(3), pp.169~174 (2004), 한국표면공학회
- H. Y. Chang, , Fall Conference of the Kor. Inst. Surf. Eng. (2004)
- J. Bohlmark, , J. Vac. Sci. Technol. A, 23, pp.18~ (2005)
- 양원균, "Al doped ZnO 박막 증착을 위한 모듈레이티드 펄스 스퍼터링", 한국표면공학회지, 45(2), pp.53~60 (2012), 한국표면공학회[DOI]
- 주정훈, "수치모델을 이용한 pulsed dc bias ICP장치의 플라즈마 특성 해석", 한국표면공학회지, 43(3), pp.154~158 (2010), 한국표면공학회
- 주정훈, "MgO 증착을 위한 유도결합 플라즈마 마그네트론 스퍼터링에서 실시간 공정 진단", 한국표면공학회지, 38(2), pp.73~78 (2005), 한국표면공학회