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회전형 마그네트론 음극의 냉각수 유동 및 열전달 해석

Flow and heat transfer analysis of cooling water in a rotating magnetron

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주제분류기계공학

초록

We have developed a numerical model to analyze flow dynamics and heat transfer characteristics of the cooling water in a circular rotating magnetron cathode by a moving boundary grid method realized in a commercial multiphysics package, CFD-ACE+. The numerical model is composed of a target, dual mass rotating cathode and cooling water connections. When the inlet and outlet of the cooling water are offset by the same distance from the rotation axis, the temperature at the center is higher by 50℃ at maximum. At 5 mm away from the target surface, the temperature profile showed typical center high characteristic. At heat input of 30 kW, the maximum temperature change of the cooling water hits 6℃ within 0.5 sec under 60 rpm. With a cooling water configuration of center in/edge out, the temperature of the center region of the target gets lowered. Within 100 seconds of plasma operation time, the cooling water temperature keeps getting higher.

Abstract

We have developed a numerical model to analyze flow dynamics and heat transfer characteristics of the cooling water in a circular rotating magnetron cathode by a moving boundary grid method realized in a commercial multiphysics package, CFD-ACE+. The numerical model is composed of a target, dual mass rotating cathode and cooling water connections. When the inlet and outlet of the cooling water are offset by the same distance from the rotation axis, the temperature at the center is higher by 50℃ at maximum. At 5 mm away from the target surface, the temperature profile showed typical center high characteristic. At heat input of 30 kW, the maximum temperature change of the cooling water hits 6℃ within 0.5 sec under 60 rpm. With a cooling water configuration of center in/edge out, the temperature of the center region of the target gets lowered. Within 100 seconds of plasma operation time, the cooling water temperature keeps getting higher.

참고문헌 (13)

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  5. 주정훈, "Bipolar Pulse Bias Effects on the Properties of MgO Reactively Deposited by Inductively Coupled Plasma-Assisted Magnetron Sputtering", Applied Science and Convergence Technology, 23(3), pp.145~150 (2014), 한국진공학회[DOI]
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