사각형 유도 결합 플라즈마 시스템의 수치 모델링
Numerical Modeling of a Rectangular Type Inductively Coupled Plasma System
1
조회
0
다운로드
3
인용
0
참고문헌
키워드
초록
Low pressure inductively coupled plasma characteristics of argon and oxygen are numerically simulated for a 400 mm rectangular type system with a plasma fluid model. The results showed lower power absorption profile at the corner than a circular one in a 13.56 MHz driven 1.5 turn antenna system with a drift-diffusion and quasi-neutrality assumption. Ions controlled by electric field are more non-uniform than metastables and the power absorption profile of oxygen plasma is affected by horizontal gas flow pattern to show 25% lower power absorption at the pumping flange side. Oxygen negative ions which are generated in electron collisional dissociation of oxygen molecules was calculated as 0.1% of oxygen atoms with similar spatial profile
Abstract
Low pressure inductively coupled plasma characteristics of argon and oxygen are numerically simulated for a 400 mm rectangular type system with a plasma fluid model. The results showed lower power absorption profile at the corner than a circular one in a 13.56 MHz driven 1.5 turn antenna system with a drift-diffusion and quasi-neutrality assumption. Ions controlled by electric field are more non-uniform than metastables and the power absorption profile of oxygen plasma is affected by horizontal gas flow pattern to show 25% lower power absorption at the pumping flange side. Oxygen negative ions which are generated in electron collisional dissociation of oxygen molecules was calculated as 0.1% of oxygen atoms with similar spatial profile
참고문헌 (7)
- 이상원, "전기적 특성을 고려한 ICP Source 설계", 한국진공학회지, 18(3), pp.176~185 (2009), 한국진공학회
- C. W. Chung, , J. Appl. Phys, 88, pp.1181~ (2000)
- 권득철, "유체 모델을 기반으로 하는 유도 결합 플라즈마 시뮬레이터 개발 현황", 한국진공학회지, 18(3), pp.151~163 (2009), 한국진공학회
- K. Jousten, "Handbook of Vacuum Technology", pp.81~ (2008), Wiley-VCH
- 주정훈, "CFD를 이용한 내장형 안테나 유도 결합 플라즈마 시스템 모델링", 한국진공학회지, 18(3), pp.164~175 (2009), 한국진공학회
- "CFD-ACE+ V2011.0 modules manual vol II", 195~
- 이효창, "유도 결합 플라즈마에서 플라즈마 변수와 전자 에너지 분포에 대한 극판 전력 인가의 영향", 한국진공학회지, 21(3), pp.121~129 (2012), 한국진공학회[DOI]