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산소 후열처리에 따른 Ga2O3/SiC photodetector의전기 광학적 특성

Impact of Oxygen Annealing on Deep-level Traps in Ga2O3/SiC Photodetectors

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초록

본 연구에서는 radio frequency (RF)-스퍼터링을 이용하여 SiC 기판 위에 Ga2O3 박막을 증착하여 Metal-Semiconductor-Metal(MSM) UV photodetector (PD)를 제작하였고, 산소 후열처리에 따른 PD 성능을 연구하였다. 산소 후열처리된 Ga2O3 박막은 외부 광에 대한 전류의 상당한 증가와 시간 의존성 on/off 광 응답 특성에서 측정된 감소시간이 1.21, 1.12 s로 후열처리를 하지 않은 박막의 감소시간인 1.34, 3.01 s 보다 더 빠른 반응을 보여주었다. 이러한 특성은 산소 후열처리 후의 산소 공공 및 결함 분포변화에 기인한다. 우리의 연구 결과는 산소 후열처리가 PD 성능 향상에 영향을 미칠 수 있다는 것을 확인하였다

Abstract

In this work, we investigated the role of oxygen annealing on the performance of Metal-Semiconductor-Metal(MSM) UV photodetector (PD) fabricated by radio frequency (RF)–sputtered Ga2O3 films on SiC substrates. OxygennnealedGa2O3 films displayed a notable increase in photocurrent and a faster decay time, indicating a decreasein persistent photoconductivity. This improvement is attributed to the reduction of oxygen vacancies and variationof defects by oxygen post-annealing. Our findings provide valuable insights into enhancing PD performance throughoxygen annealing.

참고문헌 (17)

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